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A Density Functional Theory Study of Doped Tin Monoxide as a Transparent p-type Semiconductor

机译:掺杂一氧化锡作为透明p型半导体的密度泛函理论研究

摘要

In the pursuit of enhancing the electronic properties of transparent p-type semiconductors, this work uses density functional theory to study the effects of doping tin monoxide with nitrogen, antimony, yttrium and lanthanum. An overview of the theoretical concepts and a detailed description of the methods employed are given, including a discussion about the correction scheme for charged defects proposed by Freysoldt and others [Freysoldt 2009]. Analysis of the formation energies of the defects points out that nitrogen substitutes an oxygen atom and does not provide charge carriers. On the other hand, antimony, yttrium, and lanthanum substitute a tin atom and donate n-type carriers. Study of the band structure and density of states indicates that yttrium and lanthanum improves the hole mobility. Present results are in good agreement with available experimental works and help to improve the understanding on how to engineer transparent p-type materials with higher hole mobilities.
机译:为了提高透明p型半导体的电子性能,这项工作使用密度泛函理论研究了氮,锑,钇和镧掺杂一氧化锡的影响。给出了理论概念的概述并详细介绍了所采用的方法,包括对Freysoldt等人提出的带电缺陷校正方案的讨论[Freysoldt 2009]。对缺陷的形成能的分析指出,氮取代了氧原子并且不提供电荷载流子。另一方面,锑,钇和镧替代了锡原子并提供了n型载流子。对能带结构和态密度的研究表明,钇和镧提高了空穴迁移率。目前的结果与现有的实验工作非常吻合,有助于增进对如何设计具有更高空穴迁移率的透明p型材料的理解。

著录项

  • 作者

    Bianchi Granato Danilo;

  • 作者单位
  • 年度 2012
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
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