首页> 外文OA文献 >Étude des sources plasma micro-onde à structure coaxiale pour la conception amont d'applicateurs à transformateur d'impédance intégré. Influence de la pression, de la géométrie et de la fréquence d'excitation
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Étude des sources plasma micro-onde à structure coaxiale pour la conception amont d'applicateurs à transformateur d'impédance intégré. Influence de la pression, de la géométrie et de la fréquence d'excitation

机译:同轴结构微波等离子体源的研究,用于带有集成阻抗变换器的涂药器的上游设计。压力,几何形状和激励频率的影响

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摘要

The work done within the framework of this thesis focuses on the study of magnetized and nonmagnetizedplasmas produced by coaxial structures that serve both as wave propagator and as plasma matchedimpedance coupler but also as investigation and characterization probe of the discharge. Special attention isgiven to the efficiency of coupling between the electromagnetic wave and the discharge and of speciesproduction, for different operating conditions: excitation frequency (352 and 2450 MHz), magnetic configurationand geometry of the applicator. Quantitative and comparative analysis presented in this work is based both on anexperimental and a theoretical approach. Developed analytical models and conducted electromagnetic simulationare set in connection with the experimental measurements in order to determine, on the one hand, the plasmaimpedance de-embedded of the wave propagation structure and, on the other hand, the global and localabsorption of the wave. From the experimental point of view, appropriate techniques and methods have thereforebeen developed and implemented such as, for example, the impedance plane shift method, or autointerferometry.The parametric study, conducted on a pressure range extended over several decades (10-4 - 10Torr) and power ratings from one to several hundred watts, led to a thorough investigation of the coupling type(capacitive, inductive, resistive ) which is highly dependent on the discharge characteristics and thus of theoperating parameters. Their correlation, combined with the analysis of propagation modes in a magnetizedplasma, has helped locate more accurately the areas of coupling and to identify the main power absorptionmechanisms involved. The main results obtained for the two frequencies confirm a better production efficiencyof charged species at a higher frequency (2450 MHz), the presence of a more substantial hot electron populationand a spatial expansion of the plasma when the frequency is low (352 MHz). As the solid state 352 MHztechnology is more advantageous compared to that at 2450 MHz from the viewpoint of the cost of thecomponents, it could be interesting for processes aiming to produce active chemical species. However itsinefficient coupling, of capacitive type induced by frequency reduction, requires an increased attention at thelevel of coupler configuration. For upstream development of couplers, the analytical models and theexperimental results obtained in this thesis should be a key tool in the design of high-performance microwaveplasma sources.
机译:在本文框架内完成的工作集中于研究同轴结构产生的磁化和非磁化等离子体,这些同轴结构既可以用作波传播器,又可以用作等离子体匹配阻抗耦合器,还可以用作放电的研究和表征探针。在不同的工作条件下,应特别注意电磁波与放电和物质产生之间的耦合效率:激励频率(352和2450 MHz),施药器的磁性结构和几何形状。这项工作中提出的定量和比较分析都是基于实验和理论方法。结合实验测量结果设置开发的分析模型和进行电磁仿真,以便一方面确定波传播结构中嵌入的等离子体阻抗,另一方面确定波的整体和局部吸收。从实验的角度来看,因此已经开发并实施了适当的技术和方法,例如阻抗平面移位法或自动干涉测量法。对压力范围超过几十年(10-4-10Torr)的参数研究)和额定功率从一瓦到几百瓦,这导致对耦合类型(电容,电感,电阻)的彻底研究,该耦合类型高度依赖于放电特性以及操作参数。它们的相关性与磁化等离子体中传播模式的分析相结合,有助于更准确地定位耦合区域并确定所涉及的主要功率吸收机制。在这两个频率下获得的主要结果证实,在较高的频率(2450 MHz)下,带电物质的生产效率更高,当频率较低(352 MHz)时,存在更大量的热电子种群,并且等离子体的空间膨胀。从组件成本的角度来看,由于固态352 MHz技术比2450 MHz的技术更具优势,因此对于旨在生产活性化学物质的工艺来说可能会很有趣。然而,其由于频率降低而引起的电容类型的低效率耦合需要在耦合器配置水平上增加关注。对于耦合器的上游发展,本文所获得的分析模型和实验结果应成为高性能微波等离子体源设计的关键工具。

著录项

  • 作者

    Baële Pierre;

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  • 年度 2015
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  • 原文格式 PDF
  • 正文语种 fr
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