Caractérisation et modélisation des pièges par des mesures de dispersion basse-fréquence dans les technologies HEMT InAIN/GaN pour l'amplification de puissance en gamme millimétrique

摘要

Nowadays, High Electron Mobility Transistors (HEMTs) in Gallium Nitride (GaN) take the lead in power amplification at microwave frequencies. Most of the studies and developments on those HEMTs concern AlGaN/GaN structures but alternative transistors with an InAlN barrier, which reduces the strain in the crystal lattice of the whole structure, are investigated by few laboratories. This thesis presents some advanced studies on the new InAlN/GaN HEMT developed by the III-V Lab, focusing on the trapping phenomena induced by defects inside the crystal structure. A new method for the characterization of these defects, based on low-frequency S-Parameters measurements, is proposed. Furthermore, a non-linear electro thermal model including trapping effects for an InAlN/GaN HEMT is detailed and used to design a MMIC power amplifier for Ka-band applications.