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Dispositifs électroniques et mécaniques en graphène sous environnement optimal : du graphène suspendu aux hétérostructures graphène/nitrure de bore

机译:最佳环境下的电子和机械石墨烯器件:从悬浮的石墨烯到石墨烯/氮化硼异质结构

摘要

Charge carriers in graphene form stable two-dimensional gases which are fully exposed to the environment. As a consequence, the electrical performance of graphene is strongly affected by surface charged impurities as well as topographic perturbations inherited from the underlying substrate.This thesis addresses several methods to circumvent that issue.The first method consists in embedding graphene in an optimized environment by depositing graphene onto some neutral and crystalline material. Novel 2D insulating materials such as hexagonal boron nitride buffer layer (BN) appears as ideal substrates to get rid of detrimental effect of interfacial charges and corrugation. Several fabrication schemes of Graphene/BN stacks are shown including some direct in-situ growth of graphene on BN crystal using an innovative proximity-driven chemical vapour growth based on BN exfoliation on copper. In order to explore the effects of the improved substrate on the transport properties of graphene, we have performed low temperature magneto-transport studies on these stacks. We present a direct comparison of weak localization signals with those acquired on a graphene/silica reference device. A clear increase of the coherence length is shown on Graphene/BN stacks together with improved electronic mobility and charge neutrality.Removing the substrate and suspending graphene is another approach for optimization of the graphene environment which forms the second topic covered in this thesis. After introducing an improved recipe for preserving the quality of graphene throughout an elaborate fabrication process, we probe the room- and low-temperature performance of the nano-electro-mechanical devices based on doubly clamped suspended graphene ribbons. The obtained data are used for characterizing the thermal expansion of CVD graphene.
机译:石墨烯中的电荷载体形成稳定的二维气体,该气体完全暴露于环境中。因此,石墨烯的电性能受到表面带电杂质以及从下层基板继承的形貌扰动的强烈影响。本论文提出了几种避免该问题的方法。第一种方法是通过沉积在最佳环境中嵌入石墨烯石墨烯到一些中性和晶体材料上。新型2D绝缘材料,例如六方氮化硼缓冲层(BN)似乎是摆脱界面电荷和皱纹的有害影响的理想基材。显示了石墨烯/ BN堆叠的几种制造方案,包括使用基于铜上BN剥落的创新的邻近驱动化学气相生长,在BN晶体上直接进行石墨烯的原位生长。为了探索改进的衬底对石墨烯传输性能的影响,我们对这些叠层进行了低温磁性传输研究。我们提出了一个较弱的定位信号与在石墨烯/二氧化硅参考设备上获得的信号的直接比较。石墨烯/ BN堆叠的相干长度明显增加,同时电子迁移率和电荷中性得到改善。去除衬底并悬浮石墨烯是优化石墨烯环境的另一种方法,这构成了本文的第二个主题。在介绍了一种改进的配方以在整个精细的制造过程中保持石墨烯的质量之后,我们研究了基于双重夹持的悬浮石墨烯带的纳米机电设备的室温和低温性能。获得的数据用于表征CVD石墨烯的热膨胀。

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    Arjmandi-Tash Hadi;

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  • 年度 2014
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  • 正文语种 en
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