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Optical Properties Of Treated And Untreated Monocrystalline p- Si,p-Si<100>, n-Si and n-Si<100) Wafers In The Visible Region At Room Temperature.ud

机译：室温下可见区域中已处理和未处理的单晶p-Si ，p-Si <100>，n-Si <11>和n-Si <100）晶片的光学性质。

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Hashim M. R.; Salih Kifah Q.;
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年度 2004
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机译：室温下可见区域中已处理和未处理的单晶p-Si <111>，p-Si <100>，n-Si <111>和n-Si <100>晶片的光学特性
2. Studying Natural Oxide on the Surface of n-Si(111), n-Si(100), and p-Si(111) Single Crystal Wafers by X-ray Reflection Spectroscopy [J] . E. O. Filatova, A. A. Sokolov, E. Yu. Taracheva, Technical physics letters: Letters to the Russian journal of applied physics . 2009,第1期

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机译：室温下可见区域中已处理和未处理的单晶p-Si ，p-Si <100>，n-Si <11>和n-Si <100）晶片的光学性质。
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Optical Properties Of Treated And Untreated Monocrystalline p- Si,p-Si<100>, n-Si and n-Si<100) Wafers In The Visible Region At Room Temperature.ud

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