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p(2×2) Phase of Buckled Dimers of Si(100) Observed on n-Type Substrates below 40 K by Scanning Tunneling Microscopy

机译:通过扫描隧道显微镜在40 K以下的n型衬底上观察到Si(100)屈曲二聚体的p(2×2)相

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摘要

We have investigated the basic surface reconstruction of Si(100) on well defined surfaces fabricated on various substrates at low temperatures (-80  K) by scanning tunneling microscopy. Below 40 K, the single p(2×2) phase, a phase never observed before, was observed exclusively on n-type substrates doped in the range of 0.002 to 0.017  Ω cm. We also exclude the possibility of the (2×1) symmetric dimer commonly observed at low temperature (-10  K) being the basic surface reconstruction by showing that a buckled dimer can be flip-flopped by the tunneling tip.
机译:我们通过扫描隧道显微镜研究了在低温(-80 K)下在各种衬底上制造的轮廓分明的表面上Si(100)的基本表面重构。在40 K以下,仅在0.002至0.017ΩΩ·cm范围内掺杂的n型衬底上观察到了单一的p(2×2)相,这是以前从未见过的相。我们还通过显示弯曲的二聚体可以被隧穿尖端翻转而排除了在低温(-10 K)下通常观察到的(2×1)对称二聚体作为基本表面重建的可能性。

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