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Early Postoperative Expansion of Parenchymal High-intensity Areas on T2-weighted Imaging Predicts Delayed Cerebral Edema Caused by Carmustine Wafer Implantation in Patients with High-grade Glioma

机译:T 2 加权成像在术后早期实质性高强度区域的扩张可预测高度胶质瘤患者卡莫司汀晶片植入引起的迟发性脑水肿

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摘要

Background: Carmustine (BCNU) wafer (Gliadel® Wafer) implantation after tumor resection is an approved treatment for high-grade glioma (HGG). These wafers change various characteristics on early postoperative magnetic resonance imaging (ep-MRI) including slight expansion of high-intensity areas on T2-weighted imaging (ep-T2-HIAs) into adjacent parenchyma without restricted diffusivity. We assessed the frequency of the ep-T2-HIAs after BCNU wafer implantation in HGG patients. Moreover, we focused on ep-T2-HIA expansion and its relation to delayed cerebral edema.Methods: Twenty-five consecutive HGG patients who underwent BCNU wafer implantation were assessed. First, patients were divided into ep-T2-HIA and non-ep-T2-HIA groups, and the incidence of delayed adverse effects was compared between the two groups. Subsequently, the patients were divided into delayed edema and non-delayed edema groups, and pre-, intra-, and postoperative data were compared between the two groups.Results: The ep-T2-HIA expansion and the delayed edema were evident in 9 cases (36%) and 12 cases (48%), respectively. In comparison of the ep-T2-HIA and non-ep-T2-HIA groups, delayed edema was the only delayed adverse effect associated with ep-T2-HIA expansion (P = 0.004). Univariate analysis showed a significantly higher ratio of delayed edema in the subgroups with maximal diameter of removed cavity ≤40 mm (P = 0.047) and the ep-T2-HIA expansion in comparison of the delayed edema and non-delayed edema groups. Multivariate analysis showed that the ep-T2-HIA expansion was the only independent factor associated with delayed edema (P = 0.021).Conclusion: In BCNU wafer implantation cases, ep-T2-HIA expansion was a predictive factor for delayed cerebral edema.
机译:背景:肿瘤切除后的卡莫司汀(BCNU)晶片(Gliadel®Wafer)植入是已批准的用于治疗高级神经胶质瘤(HGG)的方法。这些晶圆在术后早期磁共振成像(ep-MRI)上会改变各种特征,包括T2加权成像(ep-T2-HIA)上的高强度区域轻微扩张到邻近的实质中,而扩散不受限制。我们评估了HGG患者在BCNU晶片植入后ep-T2-HIAs的频率。此外,我们重点研究了ep-T2-HIA的扩展及其与延迟性脑水肿的关系。方法:评估了25例接受BCNU晶片植入的连续HGG患者。首先,将患者分为ep-T2-HIA组和非ep-T2-HIA组,并比较两组的迟发不良反应发生率。随后,将患者分为迟发性水肿和非迟发性水肿组,并比较两组的术前,术中和术后数据。结果:9例中有明显的ep-T2-HIA扩张和迟发性水肿。病例(36%)和12例(48%)。与ep-T2-HIA组和非ep-T2-HIA组相比,延迟水肿是与ep-T2-HIA扩张相关的唯一延迟不良反应(P = 0.004)。单因素分析显示,与延迟性水肿组和非延迟性水肿组相比,最大空洞直径≤40 mm的亚组中延迟性水肿的比例明显更高(P = 0.047),并且ep-T2-HIA扩展。多因素分析表明,ep-T2-HIA扩张是与延迟性水肿相关的唯一独立因素(P = 0.021)。结论:在BCNU晶片植入病例中,ep-T2-HIA扩张是延迟性脑水肿的预测因素。

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