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Vacancy-type defects in Er-doped GaN studied by a monoenergetic positron beam

机译:单能正电子束研究掺Er GaN中的空位型缺陷

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摘要

A relationship between intra-4f transitions of Er and vacancy-type defects in Er-doped GaN was studied by using a monoenergetic positron beam. Doppler broadening spectra of the annihilation radiation were measured for Er-doped GaN grown by molecular beam epitaxy. A clear correlation between the defect concentration and the photoluminescence (PL) intensity was observed. The major defect species detected by positrons was identified as a Ga vacancy VGa, and its concentration increased with increasing Er concentration [Er]. For the sample with [Er]=3.3 at. %, the maximum integrated intensity of PL was observed. The VGa concentration was above 1018 cm−3 and additional vacancies such as divacancies started to be introduced at this Er concentration. For the sample with higher [Er], the PL intensity decreased, and the mean size of vacancies decreased due to an introduction of precipitates and/or metastable phases.
机译:利用单能正电子束研究了掺Er GaN中Er的4f内跃迁与空位型缺陷之间的关系。测量了通过分子束外延生长的掺Er GaN的an灭辐射的多普勒加宽光谱。观察到缺陷浓度与光致发光(PL)强度之间存在明显的相关性。正电子检测到的主要缺陷种类被鉴定为Ga空位VGa,其浓度随Er浓度的增加而增加[Er]。对于[Er] = 3.3 at的样品。 %,观察到PL的最大积分强度。 VGa浓度高于1018 cm-3,并且在此Er浓度下开始引入其他空位,例如空位。对于具有较高[Er]的样品,由于引入了沉淀和/或亚稳相,PL强度降低,空位的平均大小降低。

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