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Thin films preparation by rf-sputtering of copper/iron ceramic targets withudCu/Fe=1: From nanocomposites to delafossite compounds

机译:用 ud射频溅射铜/铁陶瓷靶制备薄膜Cu / Fe = 1:从纳米复合材料到铜铁矿化合物

摘要

In the Cu–Fe–O phase diagram, delafossite CuFeO2 is obtained for the CuI oxidation state and for the Cu/Fe=1 ratio. By decreasing theudoxygen content, copper/spinel oxide composite can be obtained because of the reduction and the disproponation of cuprous ions. Many physicaludproperties as for instance, electrical, optical, catalytic properties can then be affected by the control of the oxygen stoichiometry.udIn rf-sputtering technique, the bombardment energies on the substrate can be controlled by the deposition conditions leading to differentudoxygen stoichiometry in the growing layers.udBy this technique, thin films have been prepared from two ceramic targets: CuFeO2 and CuO+CuFe2O4. We thus synthesized either Cu0/udCuxFe1−xO4 nanocomposites thin films with various Cu0 quantities or CuFeO2-based thin films.udTwo-probes conductivity measurements were permitted to comparatively evaluate the Cu0 content, while optical microscopy evidenced a selfassemblyudphenomenon during thermal annealing.
机译:在Cu–Fe–O相图中,获得了铜铁矿CuFeO2,用于CuI氧化态和Cu / Fe = 1的比率。通过降低/过氧化氢的含量,由于亚铜离子的还原和歧化,可以获得铜/尖晶石氧化物复合物。氧气化学计量的控制会影响许多物理性质,例如电性质,光学性质,催化性质。 udf射频溅射技术中,基板上的轰击能量可通过沉积条件来控制,从而导致不同的化学性质。通过这种技术,已经从两种陶瓷靶材制备了薄膜:CuFeO2和CuO + CuFe2O4。因此,我们合成了具有各种Cu0量的Cu0 / udCuxFe1-xO4纳米复合薄膜或基于CuFeO2的薄膜。 ud采用双探针电导率测量可以比较地评估Cu0的含量,而光学显微镜证明了热退火过程中的自组装 udphenomenon 。

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