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Galvanic Coupling Between Pure Copper and Pure Aluminum Experimental Approach and Mathematical Model

机译:纯铜与纯铝之间的电流耦合实验方法和数学模型

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摘要

The corrosion behavior of a pure aluminum/pure copper couple in a weakly conductive sulfate solution was investigated. Potential and current distributions on the surface of the model couple at the beginning of immersion were obtained by solving the Laplace equation using a finite element method (FEM) algorithm. The potential distribution predicted by the calculations was checked using a Ag/AgCl microreference electrode. A good agreement was found between experimental and theoretical results. It was shown that the reaction occurring at the copper electrode was oxygen reduction, while aluminum remote from the Al/Cu interface remained in the passive state. Moreover, calculations predicted a large cathodic current, related to an increase in oxygen reduction, restricted to copper at the Al/Cu interface. This led to a local pH increase reaching values higher than 9, allowing the dissolution of aluminum to occur close to the interface. Combining these data with optical and scanning electron microscope observations after 24 h of immersion in the sodium sulfate solution allowed a three-step mechanism to be proposed to explain the corrosion damage, and particularly the presence of a copper deposit on the aluminum surface, some distance from the Al/Cu interface, a phenomenon currently observed in commercial copper-rich aluminum alloys.ud
机译:研究了纯铝/纯铜对在弱导电硫酸盐溶液中的腐蚀行为。通过使用有限元方法(FEM)算法求解拉普拉斯方程,可以得出模型在浸入开始时偶对表面的电位和电流分布。使用Ag / AgCl微参比电极检查通过计算预测的电势分布。实验和理论结果之间找到了很好的协议。结果表明,发生在铜电极上的反应是氧还原反应,而远离Al / Cu界面的铝仍处于钝态。此外,计算预测与氧气还原量增加有关的大阴极电流仅限于Al / Cu界面处的铜。这导致局部pH增加达到高于9的值,从而允许铝在界面附近发生溶解。将这些数据与在硫酸钠溶液中浸泡24小时后的光学和扫描电子显微镜观察结果相结合,可以提出一种三步机理来解释腐蚀损伤,尤其是铝表面存在一定距离的铜沉积物从Al / Cu界面中发现,这是目前在商用富铜铝合金中观察到的现象。 ud

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