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Radiation Effects in Pinned Photodiode CMOS Image Sensors: Pixel Performance Degradation Due to Total Ionizing Dose

机译:固定光电二极管CMOS图像传感器中的辐射效应:由于总电离剂量导致像素性能下降

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摘要

Several Pinned Photodiode (PPD) CMOS Image Sensors (CIS) are designed, manufactured, characterized and exposed biased to ionizing radiation up to 10 kGy(SiO2 ). In addition to the usually reported dark current increase and quantum efficiency drop at short wavelengths, several original radiation effects are shown: an increase of the pinning voltage, a decrease of the buried photodiode full well capacity, a large change in charge transfer efficiency, the creation of a large number of Total Ionizing Dose (TID) induced Dark Current Random Telegraph Signal (DC-RTS) centers active in the photodiode (even when the Transfer Gate (TG) is accumulated) and the complete depletion of the Pre-Metal Dielectric (PMD) interface at the highest TID leading to a large dark current and the loss of control of the TG on the dark current. The proposed mechanisms at the origin of these degradations are discussed. It is also demonstrated that biasing (i.e., operating) the PPD CIS during irradiation does not enhance the degradations compared to sensors grounded during irradiation.
机译:设计,制造,表征了几种固定式光电二极管(PPD)CMOS图像传感器(CIS),并将其暴露在高达10 kGy(SiO2)的电离辐射下。除了通常报道的短波长暗电流增加和量子效率下降外,还显示了几种原始的辐射效应:钉扎电压的增加,埋入式光电二极管全阱容量的减少,电荷转移效率的大变化,产生大量的总电离剂量(TID)感应的在光电二极管中活动的暗电流随机电报信号(DC-RTS)中心(即使在积累了传输门(TG)的情况下),并且完全耗尽了金属前电介质(PMD)接口处于最高TID时会导致较大的暗电流,并且失去了TG对暗电流的控制能力。讨论了这些退化的根源提出的机制。还证明了,与辐射期间接地的传感器相比,辐射期间对PPD CIS施加偏压(即,操作)不会增强退化。

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