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Chemically induced charge carrier production and transport in Pd/SiO2/n-Si(111) metal-oxide-semiconductor Schottky diodes

机译:Pd / SiO2 / n-Si(111)金属氧化物半导体肖特基二极管中化学诱导的电荷载流子的产生和传输

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摘要

The energy transfer associated with reactions at metal surfaces produces energetic electrons and holes. Using ultrathin films of Pd on metal-semiconductor (MS) and metal-oxide-semiconductor (MOS) diode structures, we have investigated reaction-induced electrical phenomena associated with a variety of molecular and atomic interactions with the Pd surfaces. Distinct electronic signals are observable for species as diverse as atomic oxygen, xenon, and molecular hydrocarbons. Both MS and MOS devices allowed the detection of the chemically induced excitation of electron-hole pairs for highly exothermic chemisorption. Electronic signals from gas species with low adsorption energies were only observed in MOS devices with a thin oxide layer between the active metal film and the semiconductor. The density and distribution of interfacial states in the MOS devices have been found to be an important factor in understanding the origin and transport pathways of these "chemicurrents." A dynamic model is introduced to explain the displacement currents in the MOS devices during low-energy gas-surface interactions.
机译:与金属表面反应相关的能量转移产生高能电子和空穴。我们使用金属半导体(MS)和金属氧化物半导体(MOS)二极管结构上的Pd超薄膜,研究了与Pd表面各种分子和原子相互作用相关的反应诱导电现象。对于种类繁多的物种,如原子氧,氙气和分子碳氢化合物,可以观察到明显的电子信号。 MS和MOS器件都允许检测电子-空穴对的化学诱导激发,以实现高放热化学吸附。仅在活性金属膜和半导体之间具有薄氧化层的MOS器件中观察到了具有低吸附能的气体物种发出的电子信号。已经发现MOS器件中界面态的密度和分布是理解这些“化学电流”的起源和传输途径的重要因素。引入了一个动态模型来解释低能量气体表面相互作用期间MOS器件中的位移电流。

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