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Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

机译:利用SPR传感器的脉冲激光干涉光刻技术在大面积上制造高质量的亚微米金光栅

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摘要

Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.
机译:使用高能激光干涉光刻技术和三倍频Nd:YAG纳秒激光器制造金属光栅。首先将光栅结构记录在光敏层中,然后转移到Au膜上。成功设计,制造和表征了周期为770 nm且峰谷高度为20-60 nm的高品质Au光栅,该等离子体显示出等离子体共振响应。

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