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Microvoid formation in hydrogen-implanted ZnO probed by a slow positron beam

机译:缓慢正电子束探测氢注入ZnO中的微孔形成

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摘要

ZnO crystals were implanted with 20–80 keV hydrogen ions up to a total dose of 4.4×1015 cm−2. Positron lifetime and Doppler broadening of annihilation radiation measurements show introduction of zinc vacancy-related defects after implantation. These vacancies are found to be filled with hydrogen atoms. After isochronal annealing at 200–500 °C, the vacancies agglomerate into hydrogen bubbles. Further annealing at 600–700 °C causes release of hydrogen out of the bubbles, leaving a large amount of microvoids. These microvoids are annealed out at high temperature of 1000 °C. Raman spectroscopy for the implanted sample shows the enhancement of vibration modes at about 575 cm−1, which indicates introduction of oxygen vacancies. These oxygen vacancies disappear at temperatures of 600–700 °C, which is supposed to contribute to the hydrogen bubble formation. Cathodoluminescence measurements reveal that hydrogen ions also passivate deep level emission centers before their release from the sample, leading to the improvement of the UV emission.
机译:ZnO晶体中注入了20–80 keV的氢离子,总剂量为4.4×1015 cm-2。正电子寿命和an灭辐射的多普勒展宽显示植入后引入了锌空位相关的缺陷。发现这些空位充满氢原子。在200–500°C下等时退火后,空位聚集成氢气泡。在600–700°C下进一步退火会导致氢气从气泡中释放出来,从而留下大量微孔。这些微孔在1000°C的高温下退火。植入样品的拉曼光谱显示出在大约575 cm-1处振动模式的增强,这表明引入了氧空位。这些氧空位在600–700°C的温度下消失,这可能有助于氢气泡的形成。阴极发光测量表明,氢离子在从样品中释放出来之前,也会钝化深能级发射中心,从而改善了UV发射。

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