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Chemical vapour deposition diamond coating on tungsten carbide dental cutting tools

机译:碳化钨牙科刀具上的化学气相沉积金刚石涂层

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摘要

Diamond coatings on Co cemented tungsten carbide (WC-Co) hard metal tools are widely used for cutting non-ferrous metals. It is difficult to deposit diamond onto cutting tools, which generally have a complex geometry, using a single step growth process. This paper focuses on the deposition of polycrystalline diamond films onto dental tools, which possess 3D complex or cylindrical shape, employing a novel single step chemical vapour deposition (CVD) growth process. The diamond deposition is carried out in a hot filament chemical vapour deposition (HFCVD) reactor with a modified filament arrangement. The filament is mounted vertically with the drill held concentrically in between the filament coils, as opposed to the commonly used horizontal arrangement. This is a simple and inexpensive filament arrangement. In addition, the problems associated with adhesion of diamond films on WC-Co substrates are amplified in dental tools due to the very sharp edges and unpredictable cutting forces. The presence of Co, used as a binder in hard metals, generally causes poor adhesion. The amount of metallic Co on the surface can be reduced using a two step pre-treatment employing Murakami etching followed by an acid treatment. Diamond films are examined in terms of their growth rate, morphology, adhesion and cutting efficiency. We found that in the diamond coated dental tool the wear rate was reduced by a factor of three as compared to the uncoated tool.
机译:Co硬质合金碳化钨(WC-Co)硬质合金工具上的金刚石涂层被广泛用于切削有色金属。使用单步生长工艺很难将金刚石沉积到通常具有复杂几何形状的切削刀具上。本文着重于采用新颖的单步化学气相沉积(CVD)生长工艺在具有3D复杂或圆柱形状的牙科工具上沉积多晶金刚石膜。金刚石沉积在具有改进的灯丝布置的热丝化学气相沉积(HFCVD)反应器中进行。与常用的水平布置相反,灯丝垂直安装,钻头同心地保持在灯丝线圈之间。这是一种简单且廉价的灯丝布置。另外,由于非常锋利的边缘和不可预测的切削力,与金刚石膜在WC-Co基底上的粘附相关的问题在牙科工具中得到了放大。在硬质金属中用作粘合剂的Co的存在通常会导致较差的附着力。可以通过使用村上蚀刻的两步预处理以及随后的酸处理来减少表面上金属Co的量。根据金刚石薄膜的生长速度,形态,附着力和切割效率对其进行检查。我们发现在金刚石涂层的牙科工具中,与未涂层的工具相比,磨损率降低了三倍。

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