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Adherent diamond coatings on cemented tungsten carbide substrates with new Fe/Ni/Co binder phase

机译:具有新型Fe / Ni / Co粘结相的硬质碳化钨基材上的金刚石涂层

摘要

WC–Co hard metals continue to gain importance for cutting, mining and chipless forming tools. Cobalt metal currently dominates the market as a binder because of its unique properties. However, the use of cobalt as a binder has several drawbacks related to its hexagonal close-packed structure and market price fluctuations. These issues pushed the development of pre-alloyed binder powders which contain less than 40 wt.% cobalt. In this paper we first report the results of extensive investigations of WC–Fe/Ni/Co hard metal sintering, surface pretreating and deposition of adherent diamond films by using an industrial hot filament chemical vapour deposition (HFCVD) reactor. In particular, CVD diamond was deposited onto WC–Fe/Ni/Co grades which exhibited the best mechanical properties. Prior to deposition, the substrates were submitted to surface roughening by Murakami's etching and to surface binder removal by aqua regia. The adhesion was evaluated by Rockwell indentation tests (20, 40, 60 and 100 kg) conducted with a Brale indenter and compared to the adhesion of diamond films grown onto Co-cemented tungsten carbide substrates, which were submitted to similar etching pretreatments and identical deposition conditions. The results showed that diamond films on medium-grained WC–6 wt.% Fe/Ni/Co substrates exhibited good adhesion levels, comparable to those obtained for HFCVD diamond on Co-cemented carbides with similar microstructure.
机译:WC–Co硬质合金在切削,采矿和无屑成型工具方面继续变得越来越重要。钴金属由于其独特的性能,目前在粘合剂市场上占主导地位。然而,使用钴作为粘合剂具有与其六方密堆积结构和市场价格波动有关的若干缺点。这些问题推动了含钴量低于40%(重量)的预合金粘合剂粉末的开发。在本文中,我们首先报告了使用工业热丝化学气相沉积(HFCVD)反应器对WC-Fe / Ni / Co硬质金属烧结,表面预处理和粘附金刚石膜沉积进行的广泛研究的结果。尤其是,将CVD金刚石沉积到表现出最佳机械性能的WC-Fe / Ni / Co等级上。在沉积之前,通过村上的蚀刻对基材进行表面粗糙处理,并通过王水对基材进行表面去除。通过用Brale压头进行的Rockwell压痕测试(20、40、60和100公斤)评估附着力,并将其与生长在共水泥硬质碳化钨基材上的金刚石膜的附着力进行比较,并对其进行了类似的蚀刻预处理和相同的沉积条件。结果表明,在中等粒度WC–6 wt。%Fe / Ni / Co基体上的金刚石膜表现出良好的附着力水平,与在具有相似微观结构的共硬质合金上的HFCVD金刚石所获得的金刚石膜相当。

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