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Electroless ternary Ni-Co-P and quaternary Ni-W-Co-P coatings: Preparation and characterization

机译:化学三元Ni-Co-P和四元Ni-W-Co-P涂层:制备和表征

摘要

Autocatalytic/electroless quaternary NiCoWP coatings were prepared by using an alkaline based bath. Ternary NiCoP coatings were also prepared for the comparison. Coatings were characterized for their morphology, composition, phase transformation behavior, microhardness and corrosion resistance. Surface of the both deposits exhibited nodular structure but W incorporation in NiCoP matrix had resulted in a marginal increase in nodularity. Roughness (Ra) values measured using Optical profilometer indicated that quaternary deposits exhibited more roughness (0.08 μm) compared to ternary deposits. Compositional analysis carried out on ternary deposit showed the presence of Ni (37 wt.%), Co (53 wt.%) along with about 10 wt.% of P. Whereas W ( ≈ 3 wt.%) incorporation in NiCoP matrix had resulted in decrease in Co (48 wt.%) and P (7 wt.%) contents. Microhardness measurements made on as-plated both coatings exhibited almost similar hardness (about 430±20 VHN25gf)
机译:自动催化/化学季NiCoWP涂层是通过使用碱性浴制备的。还准备了三元NiCoP涂层用于比较。表征了涂层的形貌,组成,相变行为,显微硬度和耐腐蚀性。两种沉积物的表面均呈现结节状结构,但在NiCoP基质中掺入W导致结节性略有增加。使用光学轮廓仪测量的粗糙度(Ra)值表明,与三元沉积相比,四元沉积物显示出更大的粗糙度(0.08μm)。对三元沉积物进行的成分分析表明,存在镍(37 wt。%),钴(53 wt。%)以及约10 wt。%的P。而在NiCoP基质中掺入的W(≈3 wt。%)具有导致Co(48 wt。%)和P(7 wt。%)含量降低。在两个镀层上进行的显微硬度测量显示出几乎相似的硬度(约430±20 VHN25gf)

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