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Nitride-bonded silicon nitride from slip-cast Si + Si3N4 compacts

机译:滑铸Si + Si3N4压块中氮化物键合的氮化硅

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摘要

The dispersability of Si and Si3N4 powders in aqueous media was monitored by particle-size distribution, sedimentation behavior, viscosity/rheological studies, and electrokinetic behavior (zeta potential (ZP) analysis] as a function of pH of their slips. The pH values of 4 and 8 for Si and 10 for Si3N4 resulted in optimum dispersion, characterized by minimum in sedimentation height, minimum in viscosity, and maximum in ZP. The optimum slips of Si + Si3N4 mixtures conditioned in the pH range 8 to 10 were slip cast to obtain green compacts having a density in the range of 59-66 percent theoretical value. When nitrided, these compacts yielded nitride-bonded Si3N4 products having a density of 2.06-2.28 g/cu cm, Si3N4 bonding phase of 20-60 percent, and 3-point flexural strength values in the range of 50-150 MPa. The microstructure consisted of very fine particles as well as fibrous or whiskerlike alpha-Si3N4 binding phase enveloping the matrix Si3N4, in total consisting of 90 percent alpha-Si3N4 and the rest being beta-Si3N4 phase.
机译:Si和Si3N4粉末在水介质中的分散性通过粒度分布,沉降行为,粘度/流变学研究和电动行为(ζ电位(ZP)分析)作为其浆料pH值的函数进行监测。 Si的4和8以及Si3N4的10导致最佳分散,其特征是沉降高度最小,粘度最小,ZP最大。将pH范围为8到10的Si + Si3N4混合物的最佳粉浆浇铸成获得密度在理论值的59-66%范围内的生坯,氮化后,这些坯件产生氮化物结合的Si3N4产品,其密度为2.06-2.28 g / cu cm,Si3N4结合相为20-60%,并且三点抗弯强度值在50-150 MPa范围内,微观结构包括非常细的颗粒以及包围基质Si3N4的纤维状或晶须状的α-Si3N4结合相,总共包含90%的α -Si3N4,其余为β-Si3N4相。

著录项

  • 作者

    Rao Ramachandra R; Kannan TS;

  • 作者单位
  • 年度 2002
  • 总页数
  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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