首页> 外文OA文献 >Characterization of bulk hexagonal boron nitride single crystals grown by the metal flux technique
【2h】

Characterization of bulk hexagonal boron nitride single crystals grown by the metal flux technique

机译:金属助熔剂生长的块状六方氮化硼单晶的表征

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The optical and physical properties of hexagonal boron nitride single crystals grown from a molten metal solution are reported. The hBN crystals were grown by precipitation from a nickel-chromium flux with a boron nitride source, by slowly cooling from 1500 °C at 2-4°C/h under a nitrogen flow at atmospheric pressure. The hBN crystals formed on the surface of the flux with an apparent crystal size up to 1 to 2 mm in diameter. Individual grains were as large as 100-200 µm across. Typically, the flakes removed from the metal were 6 to 20 µm thick. Optical absorption measurements suggest a bandgap of 5.8 eV by neglecting the binding energy of excitons in hBN. The highest energy photoluminescence peak was at 5.75 eV at room temperature. The hBN crystals typically had a pit density of 5 x 10⁶ cm⁻² after etching in a molten eutectic mixture of potassium hydroxide and sodium hydroxide. The quality of these crystals suggests they are suitable as substrates for two dimensional materials such as graphene and gallium nitride based devices.
机译:报道了从熔融金属溶液中生长的六方氮化硼单晶的光学和物理性质。 hBN晶体是通过使用氮化硼源从镍铬助熔剂中沉淀出来,在大气压下在氮气流下以2-4°C / h的速度从1500°C缓慢冷却而生长的。 hBN晶体在助焊剂表面形成,其表观晶体直径最大为直径1-2 mm。单个晶粒的宽度最大为100-200 µm。通常,从金属上去除的薄片厚度为6至20 µm。光吸收测量表明,通过忽略hBN中激子的结合能,带隙为5.8 eV。在室温下,最高能量的光致发光峰在5.75 eV。在氢氧化钾和氢氧化钠的熔融低共熔混合物中蚀刻后,hBN晶体的凹坑密度通常为5 x 10-4 cm-2。这些晶体的质量表明它们适合用作二维材料(例如石墨烯和氮化镓基器件)的基材。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号