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Structural and optical properties of reactive-sputtered films of V_2O_5 : Measurement of optical bandgap and roughness correction

机译:V_2O_5反应溅射膜的结构和光学性质:光学带隙的测量和粗糙度校正

摘要

Films of vanadium oxide were prepared by reactive DC magnetron sputtering. Crystalline films of α-V_2O_5 could be obtained at 500℃ for an hour in oxygen atmosphere. Further annealing made rod-like crystallites to grow, and optical spectra of transmittance and reflectance changed with annealing, but the change after the crystallization could be explained by the increase in the surface roughness and the corrected absorption coefficients yielded a value of 2.25 eV for the bandgap energy.
机译:通过反应性直流磁控溅射制备氧化钒薄膜。在氧气气氛中,在500℃下加热一小时,可获得α-V_2O_5晶体膜。进一步的退火使棒状微晶生长,并且透射率和反射率的光谱随退火而变化,但是结晶后的变化可以用表面粗糙度的增加来解释,校正后的吸收系数为2.25 eV。带隙能量。

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