Direct Nanopatterning of Metal Surfaces Using Self-Assembled Molecular Films

摘要

The development of new methods for nanopatterning of metal surfaces is discussed. Self-assembled molecular films are used for the purpose. Patterned metallic surfaces can be modified by alkanethiolate self-assembled monolayers (SAM) to be used as a further mold for master replication. It is also demonstrated that the patterned metallic surfaces are excellent templates for producing nanopatterned metal-semiconductor hybrid surfaces by controlled chemical reactions.