首页> 外文OA文献 >Interfacial phases and electrical characteristics of ferreoelectric strontium bismuth tantalate films on Pt/TiO2 and tTi/Pt/Ti heterostructure electrodes
【2h】

Interfacial phases and electrical characteristics of ferreoelectric strontium bismuth tantalate films on Pt/TiO2 and tTi/Pt/Ti heterostructure electrodes

机译:Pt / TiO2和tTi / Pt / Ti异质结构电极上铁电锶钽酸铋薄膜的界面相和电特性

摘要

Strontium bismuth tantalate (SBT) thin films containing Sr defect and Bi excess have been prepared by chemical solution deposition onto spontaneously oxidized Si(100) substrates with two different heterostructure electrodes: Pt/TiO2 and Ti/Pt/Ti. Layered perovskite SBT films were crystallized in oxygen by rapid thermal processing at 973 K for 1 h with an intermediate treatment at 823 K for 2 h. Crystalline phases of the films were monitored by X-ray diffraction analysis with Bragg-Brentano geometry and with grazing incidence. Interfaces developed between the SBT layer and the bottom electrode during thermal treatment were analyzed by X-ray photoelectron and Rutherford backscattering spectroscopies. Chemical composition of the interfaces was dependent on the heterostructure electrode. Interfaces of the SBT films on Pt/TiO2 contain Pt and Bi, whereas those of the films on Ti/Pt/Ti contain Pt, Bi, Ti, and O. Electrical characteristics of these interfaces were deduced from their leakage current behavior. Leakages of SBT films onto Pt/TiO2 are governed by a Schottky emission model at all temperatures, with a barrier height of ∼0.89 eV. Leakages of SBT films onto Ti/Pt/Ti can only be fit to a Schottky model at high temperatures. Despite the so different leakage behavior of the films, their ferroelectric properties and fatigue characteristics are similar, with values of remanent polarization of Pr ≈ 5 μC/cm2 and of the coercive field of E c ≈ 65 KV/cm, and with a ∼20% of reduction of Pr after ∼1010 cycles. These properties are appropriate for their use in nonvolatile memories. © 2005 American Chemical Society.
机译:通过化学溶液沉积到具有两个不同异质结构电极(Pt / TiO2和Ti / Pt / Ti)的自发氧化的Si(100)衬底上,已经制备了含有Sr缺陷和过量Bi的钽酸锶铋(SBT)薄膜。通过在973 K下快速热处理1 h,在823 K下进行2 h的中间处理,使层状钙钛矿SBT膜在氧气中结晶。通过具有布拉格-布伦塔诺(Bragg-Brentano)几何形状和掠入射的X射线衍射分析监测膜的结晶相。通过X射线光电子和卢瑟福反向散射光谱分析了热处理期间SBT层和底部电极之间形成的界面。界面的化学组成取决于异质结构电极。 Pt / TiO2上的SBT膜的界面包含Pt和Bi,而Ti / Pt / Ti上的SBT膜的界面包含Pt,Bi,Ti和O。这些界面的电特性是由它们的泄漏电流行为推导的。 SBT膜在Pt / TiO2上的泄漏在所有温度下均由肖特基发射模型控制,势垒高度约为0.89 eV。 SBT膜在Ti / Pt / Ti上的泄漏仅适用于高温下的肖特基模型。尽管薄膜的泄漏行为如此不同,但它们的铁电性能和疲劳特性却相似,剩余极化值为Pr≈5μC/ cm2,矫顽场E c≈65 KV / cm,约为20。 〜1010次循环后Pr的还原百分比。这些属性适合在非易失性存储器中使用。 ©2005美国化学学会。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号