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Doping, carriers and intergrain fields in ZnO films: An impedance and confocal Raman spectroscopy study

机译:ZnO薄膜中的掺杂,载流子和晶间场:阻抗和共聚焦拉曼光谱研究

摘要

A detailed study of the effect of doping on the electrical transport characteristics of ZnO thin films is presented. This is performed for undoped ZnO and for ZnO doped with Al and Ga. The films have been characterized by conventional direct current, DC, Hall transport measurements, impedance spectroscopy, IS, and confocal Raman spectroscopy, CRS. The variation of the transport properties caused by doping is related to a variation of the built-in electric field at the grain boundaries. This variation is observed through a variation of confocal Raman spectroscopy localized bands that are related to structural ZnO defects. This technique allows one to measure the Raman spectra as electrical current is being fed to the film. The comparison between DC Hall transport measurements and impedance spectroscopy data confirms a semiconductor like behavior for ZnO and ZnO:Al and a metallic-like behavior of ZnO:Ga. This is due to the different amount of ions that enter substitutionally in the ZnO matrix and thus introduce carriers that compensate charge traps at the grain boundaries. The variation of this charge trap density and the associated electric field is probably the most relevant limiting factor of these films' transport properties. © 2013 Elsevier B.V. All rights reserved.
机译:详细介绍了掺杂对ZnO薄膜电传输特性的影响。这是针对未掺杂的ZnO以及掺杂有Al和Ga的ZnO进行的。这些膜的特征在于常规的直流电,DC,霍尔传输测量,阻抗谱,IS和共焦拉曼光谱,CRS。由掺杂引起的传输特性的变化与晶粒边界处的内置电场的变化有关。通过共焦拉曼光谱局部带的变化可以观察到这种变化,该共聚焦拉曼光谱局部带与结构ZnO缺陷有关。这项技术允许在将电流馈入胶片时测量拉曼光谱。直流霍尔传输测量结果和阻抗谱数据之间的比较证实了ZnO和ZnO:Al的半导体行为和ZnO:Ga的金属行为。这是由于离子的数量不同,这些离子替代性地进入ZnO矩阵,从而引入了能补偿晶界处电荷陷阱的载流子。电荷陷阱密度和相关电场的变化可能是这些薄膜传输特性的最相关限制因素。 ©2013 Elsevier B.V.保留所有权利。

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