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Colored and transparent oxide thin films prepared by magnetron sputtering: The glass blower approach

机译:磁控溅射制备的彩色透明氧化物薄膜:玻璃鼓风机方法

摘要

This work describes the reactive magnetron sputtering processing at room temperature of several mixed oxide MxSiyOz thin films (M: Fe, Ni, Co, Mo, W, Cu) intended for optical, coloring, and aesthetic applications. Specific colors can be selected by adjusting the plasma gas composition and the Si-M ratio in the magnetron target. The microstructure and chemistry of the films are characterized by a large variety of techniques including X-ray photoemission spectroscopy, X-ray absorption spectroscopy (XAS), and infrared spectroscopy, while their optical properties are characterized by UV-vis transmission and reflection analysis. Particularly, XAS analysis of the M cations in the amorphous thin films has provided valuable information about their chemical state and local structure. It is concluded that the M cations are randomly distributed within the SiO2 matrix and that both the M concentration and its chemical state are the key parameters to control the final color of the films. © 2013 American Chemical Society.
机译:这项工作描述了用于光学,着色和美学应用的几种混合氧化物MxSiyOz薄膜(M:Fe,Ni,Co,Mo,W,Cu)在室温下的反应磁控溅射处理。可以通过调节磁控管靶中的等离子体气体成分和Si-M比来选择特定的颜色。薄膜的微观结构和化学性质通过多种技术进行表征,包括X射线光发射光谱法,X射线吸收光谱法(XAS)和红外光谱法,而其光学性能则通过UV-vis透射和反射分析来表征。特别地,对非晶薄膜中M阳离子的XAS分析提供了有关其化学状态和局部结构的有价值的信息。可以得出结论,M阳离子随机分布在SiO2基质中,并且M浓度及其化学状态是控制薄膜最终颜色的关键参数。 ©2013美国化学学会。

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