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Replication and dimensional quality control of industrial nanoscale surfaces using calibrated AFM measurements and SEM image processing

机译：使用校准的AFM测量和SEM图像处理对工业纳米级表面进行复制和尺寸质量控制

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作者
TOSELLO G.; HANSEN H.N.; MARINELLO F.; GASPARIN S.;
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年度 2010
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原文格式 PDF
正文语种 eng
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入库时间 2022-08-20 20:11:23

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1. Replication and dimensional quality control of industrial nanoscale surfaces using calibrated AFM measurements and SEM image processing [J] . G. Tosello, H. N. Hansen, F. Marinello, CIRP Annals . 2010,第1aCDaROM期

机译：使用校准的AFM测量和SEM图像处理对工业纳米级表面进行复制和尺寸质量控制
2. QUALITY INSPECTION AND PROCESS CONTROL IN THE GLASS CONTAINER INDUSTRY BY OPTICAL MEASUREMENTS WITH INDUSTRIAL IMAGE PROCESSING SYSTEMS [J] . R. FIEDLER International Glass Journal . 2003,第127期

机译：通过工业图像处理系统的光学测量对玻璃容器行业进行质量检查和过程控制
3. AFM-VNA Technique Enables Compound, Calibrated Electrical and Spatial Measurements at Nanoscale [J] . Craig Wall Microwave Journal . 2010,第12期

机译：AFM-VNA技术可实现纳米级的复合，校准的电和空间测量
4. Study of Critical Dimension and Overlay Measurement Methodology Using SEM Image Analysis for Process Control [C] . Tae Yong Lee, Byoung Ho Lee, Soo Bok Chin, Metrology, Inspection, and Process Control for Microlithography XX pt.2 . 2006

机译：使用SEM图像分析进行过程控制的临界尺寸和覆盖测量方法的研究
5. Surface reconstruction from AFM and SEM images. [D] . Seeger, Adam. 2004

机译：从AFM和SEM图像进行表面重建。
6. Fabrication of Scanning Electrochemical Microscopy-Atomic Force Microscopy (SECM-AFM) Probes to Image Surface Topography and Reactivity at the Nanoscale [O] . Jeyavel Velmurugan, Amit Agrawal, Sangmin An, -1

机译：扫描电化学显微镜-原子力显微镜（SECM-AFM）探针的制备以纳米级成像表面形貌和反应性
7. Replication and dimensional quality control of industrial nanoscale surfaces using calibrated AFM measurements and SEM image processing [O] . Tosello Guido, Hansen Hans Nørgaard, Marinello F., 2010

机译：使用校准的aFm测量和sEm图像处理对工业纳米级表面进行复制和尺寸质量控制

Replication and dimensional quality control of industrial nanoscale surfaces using calibrated AFM measurements and SEM image processing

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