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High Orientation CdS Thin Films Grown by Pulsed Laser and Thermal Evaporation

机译:脉冲激光和热蒸发生长的高取向CdS薄膜

摘要

[[abstract]]Undoped CdS films have been grown by pulsed laser evaporation (PLE) and thermal evaporation (TE) techniques on Corning’s 7059 glass at a substrate temperature between room temperature and 250 °C. The deposition rates are 0.07 Å/s for PLE and 60 Å/s for the TE technique. These as‐deposited films have high (002) preferred orientation by both techniques even without preheating the substrate. However, films deposited by PLE have more preferred orientation and larger grain size. These features make the PLE films have sharper Raman peaks, smaller Raman shift of surface mode and more overtones of longitudinal optical phonon mode observed than those in TE films. The transparency of PLE or TE films for wavelengths which are larger than that of absorption edge is around 90% on average.
机译:[[抽象]]未掺杂的CdS膜已通过脉冲激光蒸发(PLE)和热蒸发(TE)技术在康宁7059玻璃上在室温至250 C之间的基底温度下生长。 PLE的沉积速率为0.07Å/ s,TE技术的沉积速率为60Å/ s。即使没有预热基板,这两种技术所沉积的薄膜都具有较高的(002)优先取向。然而,通过PLE沉积的膜具有更优选的取向和更大的晶粒尺寸。这些特征使得PLE薄膜具有比TE薄膜更陡峭的拉曼峰,较小的表面模拉曼位移和更多的纵向光学声子模泛音。大于吸收边缘波长的PLE或TE薄膜的透明度平均约为90%。

著录项

  • 作者

    Dai C. M.;

  • 作者单位
  • 年度 2013
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
  • 中图分类
  • 入库时间 2022-08-20 20:20:15

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