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Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials

机译：超孔SiOCH低k材料中应力引起的泄漏电流与介电性能的相关性

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status: published

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Wu Chen; Li Yunlong; Lesniewska Alicja; Varela Pedreira Olalla; de Marneffe Jean-Francois; Ciofi Ivan; Verdonck Patrick; Baklanov Mikhaïl; Boemmels Juergen; De Wolf Ingrid; Tokei Zsolt; Croes Kristof;
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年度 2015
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正文语种 en
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1. Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials [J] . C. Wu, Y. Li, A. Lesniewska, Journal of Applied Physics . 2015,第16期

机译：超孔SiOCH低k材料中应力引起的泄漏电流与介电性能的相关性
2. Current leakage relaxation and charge trapping in ultra-porous low-k materials [J] . Journal of Applied Physics . 2014,第8期

机译：超多孔低k材料中的电流泄漏松弛和电荷陷阱
3. Current leakage relaxation and charge trapping in ultra-porous low-k materials [J] . Juan Borja, Joel L. Plawsky, T.-M. Lu, Journal of Applied Physics . 2014,第8期

机译：超多孔低k材料中的电流泄漏松弛和电荷陷阱
4. Engineering implication of the correlation between the leakage current in high-k dielectric materials and the electronic defect states detected by zero-bias thermally stimulated current spectroscopy [C] . W. S. Lau China Semiconductor Technology International Conference . 2018

机译：高k电介质材料中的泄漏电流与零偏置热激发电流光谱仪检测到的电子缺陷状态之间的相关性的工程意义
5. Study on the leakage current behavior and conduction mechanism of porous low-k in copper/porous low-k interconnects: The influence of extrinsic factors. [D] . Chen, Liangshan. 2010

机译：铜/多孔低k互连中多孔低k的泄漏电流行为和传导机理的研究：外在因素的影响。
6. Leakage Current Mechanism of InN-Based Metal-Insulator-Semiconductor Structures with Al2O3 as Dielectric Layers [O] . X. Wang, G. Z. Zhang, Y. Xu, 2016

机译：以Al2O3为介电层的InN基金属-绝缘体-半导体结构的漏电流机理
7. Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric [O] . Wu Chen, Li Yunlong, Ciofi Ivan, 2015

机译：理解SiOCH低k介电质的固有降解和击穿机理
8. Study of Positronium in Low-k Dielectric Films by Means of 2D-Angular Correlation Experiments at a High-Intensity Slow-Positron Beam [R] . Gessmann, T., Petkov, M. P., Weber, M. H., 2005

机译：用高强度慢正电子束二维角相关实验研究低k介质薄膜中的正电子

Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials

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