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Formation Mechanisms of Low-Resistivity Ni/Pt Ohmic Contacts to Li-Doped p-Type ZnO

机译:掺锂p型ZnO的低电阻Ni / Pt欧姆接触形成机理

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摘要

Low-resistivity Ni/Pt ohmic contacts were fabricated on Li-doped, p-type ZnO films using electron-beam evaporation, which were confirmed by the transmission line model technique. The current transport and formation mechanisms of the ohmic contacts were investigated by X-ray photoelectron spectroscopy and temperature-dependent contact resistivity measurements. Activation of acceptors in the ZnO films, formation of Pt-Ni solid solution near the metal surface, and forming a Zn-deficient region near the ZnO surface were considered to result in the improvement of the ohmic contacts. The relatively low barrier height confirmed that the surface states played an important role in the formation of ohmic contacts. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.3055337] All rights reserved.
机译:利用电子束蒸发技术在掺锂的p型ZnO薄膜上制备了低电阻率的Ni / Pt欧姆接触,并通过传输线模型技术进行了验证。通过X射线光电子能谱和温度相关的接触电阻率测量研究了欧姆接触的电流传输和形成机理。 ZnO膜中受体的活化,在金属表面附近形成Pt-Ni固溶体以及在ZnO表面附近形成Zn缺陷区被认为可以改善欧姆接触。较低的势垒高度证实了表面状态在欧姆接触的形成中起着重要作用。 (C)2008年电化学学会。 [DOI:10.1149 / 1.3055337]保留所有权利。

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