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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

机译：在CF4等离子体暴露的2.0 p-OSG薄膜上用作密封剂的硅烷的填充成型表面限制

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status: published

机译：状态：已发布

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Sun Yiting; Levrau Elisabeth; Zhang Liping; Geypen Jef; Meersschaut Johan; Franquet Alexis; Quoc Toan Le; de Marneffe Jean-Francois; Bender Hugo; Struyf Herbert; Detavemier Christophe; Baklanov Mikhail; De Feyter Steven; Armini Silvia;
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年度 2015
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1. Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films [J] . Sun Yiting, Levrau Elisabeth, Zhang Liping, Microelectronic Engineering . 2015,第apra期

机译：在CF4等离子体暴露的2.0 p-OSG薄膜上用作密封剂的硅烷的填充成型表面限制
2. Etching Characteristics of SixNy Film on Textured Single Crystalline Silicon Surface Using Ar/CF4 and He/CF4 Surface-Discharge Plasma [J] . Toshiyuki Hamada, Shunsuke Masuda, Kazuki Nishida, Coatings . 2020,第6期

机译：使用Ar / CF4和He / CF4表面放电等离子体蚀刻纹理单晶硅表面纺织膜的蚀刻特性
3. Structure of silane layer formed on silica particle surfaces by treatment with silane coupling agents having various functional groups [J] . Yoshinobu Nakamura, Ryota Yamazaki, Tomoyoshi Fukuda Journal of Adhesion Science and Technology: The International Journal of Theoredtical and Basic Aspects of Adhesion Science and Its Applications in All Areas of Technology . 2014,第19期

机译：通过用具有各种官能团的硅烷偶联剂处理在二氧化硅颗粒表面上形成的硅烷层的结构
4. Plasma enhanced ALD pore sealing for highly porous SiOCH films with k = 2.0 [C] . Kimura Yosuke, Kobayashi Akiko, Ishikawa Dai, Interconnect Technology Conference (IITC), 2012 IEEE International . 2012

机译：等离子增强ALD孔密封，用于k = 2.0的高度多孔SiOCH膜
5. Adsorption of silane films on iron surfaces: Characterization of films and development of novel silane-based pretreatments to replace chromates and phosphates [D] . Zhang, Chunbin 1997

机译：硅烷膜在铁表面的吸附：膜的表征以及基于硅烷的新型预处理技术的发展，以取代铬酸盐和磷酸盐
6. Scanning Auger Microscopy Studies of Silane Films Grown on Plasma-Modified HOPG Surfaces [O] . Jade K. Taylor, Jasmine R. Wiese, Sarah L. Harmer, 2018

机译：等离子体改性HOPG表面上生长的硅烷膜的扫描俄歇显微镜研究
7. Study on films of organofunctional silanes on transition metal surfaces - The structure of gamma-aminopropyltrimethoxysilane films on nickel electrodes [O] . Gu RA, 顾仁敖, Chen H, 2003

机译：过渡金属表面有机官能硅烷薄膜的研究-镍电极上的γ-氨基丙基三甲氧基硅烷薄膜的结构

Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

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