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Unusual Modification of CuCl or CuBr Films by He Plasma Exposure Resulting in Nanowire Formation

机译:He等离子体暴露对CuCl或CuBr膜的不寻常修饰导致纳米线形成

摘要

In this paper, we present it method for growing copper-based nanowires. The method is based on the unusual modification of a halogenated Copper Surface by exposure to I helium plasma. The nanowires have diameters ranging between 50 and 150 run and lengths up to 50 mu m. They are polycrystalline, and large parts of the wires have it pronounced core-shell structure with a dense shell and less material inside. The wires are grown in it plasma environment at room temperature, and large amounts can be grown in a matter of minutes. The critical process parameters for the growth process are the gas now and pressure Settings, and the impact thereof will be discussed in detail. In order to gain insight in a possible growth mechanism, Out observations are compared with literature oil the growth of silver whiskers from halogenated silver crystallites. Finally, photoluminescence spectra of the wires are discussed in view of the analytical data about the stoichiometry and structure of the nanowires.
机译:在本文中,我们介绍了用于生长铜基纳米线的方法。该方法基于通过暴露于氦氦等离子体对卤化铜表面的异常修饰。纳米线的直径在50到150纳米之间,长度最大为50微米。它们是多晶的,导线的大部分具有明显的核壳结构,且壳致密,内部材料较少。电线在等离子环境中于室温下生长,并且可以在数分钟内生长出大量电线。生长过程的关键过程参数是现在的气体和压力设置,将对其影响进行详细讨论。为了深入了解可能的生长机理,将Out的观察结果与文献中的油从卤化银微晶中生长的晶须进行了比较。最后,根据关于纳米线的化学计量和结构的分析数据,讨论了线的光致发光光谱。

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