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Mechanical properties of intermetallic compounds in electrodeposited multilayered thin film at small scale by nanoindentation

机译:纳米压痕技术在电沉积多层薄膜中金属间化合物的机械性能

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摘要

Mechanical properties of intermetallic compounds (IMCs) which were formed in electrodeposited Cu/Sn and Cu/Ni/Sn multilayered thin film have been investigated. The layers of Cu, Sn and Ni were formed by electrodeposition technique using copper pyrophosphate, tin methanesulfonic and nickel Watts baths, respectively. After synthesis, samples were subjected to high temperature aging at 150 degrees C for 168 h. Two different types of intermetallics Cu3Sn and Cu6Sn5 were formed in Cu/Sn. After adding ultra-thin layer of Ni (70 nm) in between Cu and Sn layers, (Cu, Ni)(6)Sn-5 was formed after aging at similar condition to that of Cu/Sn. Tin whisker growth was not observed in both samples after preserving the samples in air for 365 days. Hardness and elastic moduli of all three different types of IMCs were measured by using a Hysitron Triboindenter 750 Ubi system. Hardness of the three IMCs Cu3Sn, Cu6Sn5, (Cu, Ni)(6)Sn-5 and Cu were found to be 5.99, 6.61, 7.43 and 1.55 GPa, respectively. The addition of Ni suppressed the growth of Cu3Sn greatly. This is expected to lead to better reliability of electronic interconnections as Cu3Sn is often associated with void formation. (C) 2015 Elsevier B.V. All rights reserved.
机译:研究了在电沉积​​的Cu / Sn和Cu ​​/ Ni / Sn多层薄膜中形成的金属间化合物(IMC)的机械性能。通过分别使用焦磷酸铜,甲烷磺酸锡和镍瓦特浴的电沉积技术形成Cu,Sn和Ni层。合成后,将样品在150摄氏度的高温下老化168小时。在Cu / Sn中形成了两种不同类型的金属间化合物Cu3Sn和Cu6Sn5。在Cu和Sn层之间添加Ni的超薄层(70 nm)后,在与Cu / Sn相似的条件下老化后形成了(Cu,Ni)(6)Sn-5。将样品在空气中保存365天后,两个样品中均未观察到锡晶须的生长。使用Hysitron Triboindenter 750 Ubi系统测量所有三种不同类型的IMC的硬度和弹性模量。发现三个IMC Cu3Sn,Cu6Sn5,(Cu,Ni)(6)Sn-5和Cu的硬度分别为5.99、6.61、7.43和1.55 GPa。 Ni的添加极大地抑制了Cu 3 Sn的生长。预计这将导致电子互连的可靠性更高,因为Cu3Sn通常与空隙形成有关。 (C)2015 Elsevier B.V.保留所有权利。

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