首页> 外文OA文献 >Fabrication of nanostructured ZnO/MgO bilayer with PVDF-TrFE layer for metal-ferroelectr-icinsulator- metal (MFIM) capacitor application / Habibah Zulkefle
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Fabrication of nanostructured ZnO/MgO bilayer with PVDF-TrFE layer for metal-ferroelectr-icinsulator- metal (MFIM) capacitor application / Habibah Zulkefle

机译:带有PVDF-TrFE层的纳米结构ZnO / MgO双层膜的制造,用于金属-铁电-绝缘体-金属(MFIM)电容器应用/ Habibah Zulkefle

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摘要

The nano-MgO films, nano-ZnO films and nanostructured ZnO/MgO bilayer films were synthesized using sol-gel spin coating method. The uniform and smooth nano- ZnO film was utilized as the oxide dielectric template to produce nanostructured ZnO/MgO bilayer films. The nano-MgO films and nanostructured ZnO/MgO bilayer films were deposited at various deposition parameters (solution concentration, number of layer and annealing temperature). The effect of deposition parameters towards morphology and dielectric properties of nano-MgO films and nanostructured ZnO/MgO bilayer films was investigated. The variation of solution concentrations revealed that nano-MgO film and nanostructured ZnO/MgO bilayer film with 0.4M concentration produced improvement in the electrical properties as seen by the uniform particle distribution. The 0.4M nanostructured ZnO/MgO bilayer film showed an increment in dielectric constant, k (5.71) in comparison to 0.4M nano-MgO single layer film. Hence, 0.4M concentration was the optimized solution concentration utilized for both nano-MgO films and nanostructured ZnO/MgO bilayer films, for investigating the number of deposition layers of these films. For both films, 10 layers of MgO were found to give significant improvement in the surface properties. Most importantly, an enhancement in k value (9.70) for nanostructured ZnO/MgO bilayer film annealed at 475°C. This study has produced a novel metal-ferroelectric-insulatormetal (MFIM) capacitor configuration of ZnO/MgO/PVDF-TrFE by utilizing optimized nanostructured ZnO/MgO bilayer film as dielectric layer, with the integration of PVDF-TrFE as polymeric ferroelectric. With this novel MFIM capacitor configuration, a high electrical strength of polarization-field (P-E) hysteresis loop was obtained. In addition, the enhancement in k value (19.42) for ZnO/MgO/PVDF-TrFE film was caused by the increased in β-phase crystals in the film. This contributed to an improvement in the spontaneous polarization of ZnO/MgO/PVDF-TrFE film. Ultimately, the capacitance value obtained for ZnO/MgO/PVDF-TrFE film was significantly enhanced (35 pF) with the addition of PVDF-TrFE co-polymer film in the capacitor configuration.
机译:采用溶胶-凝胶旋涂法合成了纳米MgO薄膜,纳米ZnO薄膜和纳米结构ZnO / MgO双层薄膜。均匀且光滑的纳米ZnO薄膜被用作氧化物介电模板以产生纳米结构的ZnO / MgO双层薄膜。纳米MgO薄膜和纳米结构的ZnO / MgO双层薄膜以各种沉积参数(溶液浓度,层数和退火温度)沉积。研究了沉积参数对纳米MgO薄膜和纳米结构ZnO / MgO双层薄膜的形貌和介电性能的影响。溶液浓度的变化表明,浓度均匀的纳米MgO薄膜和浓度为0.4M的纳米结构ZnO / MgO双层薄膜的电性能有所改善,从均匀的颗粒分布可以看出。与0.4M纳米MgO单层膜相比,0.4M纳米结构ZnO / MgO双层膜的介电常数k(5.71)增加。因此,0.4M浓度是用于纳米MgO膜和纳米结构ZnO / MgO双层膜的最佳溶液浓度,用于研究这些膜的沉积层数。对于这两种膜,发现10层MgO都可以显着改善表面性能。最重要的是,在475°C退火的纳米结构ZnO / MgO双层薄膜的k值提高了(9.70)。这项研究利用优化的纳米结构ZnO / MgO双层薄膜作为介电层,并结合了PVDF-TrFE作为聚合物铁电体,生产了一种新颖的ZnO / MgO / PVDF-TrFE金属-铁电绝缘金属(MFIM)电容器配置。利用这种新颖的MFIM电容器配置,可以获得高的极化场(P-E)磁滞回线电气强度。另外,ZnO / MgO / PVDF-TrFE膜的k值(19.42)的增加是由于膜中β相晶体的增加引起的。这有助于改善ZnO / MgO / PVDF-TrFE膜的自发极化。最终,通过在电容器配置中添加PVDF-TrFE共聚物膜,可以显着提高ZnO / MgO / PVDF-TrFE膜的电容值(35 pF)。

著录项

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    Zulkefle Habibah;

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  • 年度 2016
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  • 原文格式 PDF
  • 正文语种 en
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