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Electromagnetic Interference (EMI) Resisting Analog Integrated Circuit Design Tutorial

机译:抗电磁干扰(EMI)的模拟集成电路设计教程

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摘要

This work introduces fundamental knowledge of EMI, and presents three basic features correlated to EMI susceptibility: nonlinear distortion, asymmetric slew rate (SR) and parasitic capacitance. Different existing EMI-resisting techniques are analyzed and compared to each other in terms of EMI-Induced input offset voltage and other important specifications such as current consumption. In this work, EMI-robust analog circuits are proposed, of which the architecture is based on source-buffered differential pair in the previous publications. The EMI performance of the proposed topologies has been verified within a test IC which was fabricated in NCSU 0.5um CMOS technology. Experimental results are presented when an EMI disturbance signal of 400mV and 800mV amplitude was injected at the input terminals, and compared with a conventional and an existing topology. The tested maximal EMI-induced input offset voltage corresponds to -222mV for the new structure, which is compared to -712mV for the conventional one and -368mV for the one using existing source-buffered technique in literature. Furthermore the overall performances of the circuits such as current consumption or input referred noise are also provided with the corresponding simulation results.
机译:这项工作介绍了EMI的基础知识,并提出了与EMI敏感性相关的三个基本特征:非线性失真,不对称转换率(SR)和寄生电容。根据EMI引起的输入失调电压和其他重要指标(例如电流消耗),对现有的各种抗EMI技术进行了分析和比较。在这项工作中,提出了EMI稳健的模拟电路,其架构基于先前出版物中的源缓冲差分对。拟议拓扑的EMI性能已在使用NCSU 0.5um CMOS技术制造的测试IC中得到验证。当在输入端注入400mV和800mV振幅的EMI干扰信号时,将给出实验结果,并将其与常规拓扑和现有拓扑进行比较。使用文献中现有的源缓冲技术,新结构所测试的最大EMI感应输入失调电压对应于新结构的-222mV,与传统结构的-712mV和一个结构的-368mV相比。此外,电路的整体性能(例如电流消耗或输入参考噪声)也提供了相应的仿真结果。

著录项

  • 作者

    Yu Jingjing;

  • 作者单位
  • 年度 2012
  • 总页数
  • 原文格式 PDF
  • 正文语种 en_US
  • 中图分类

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