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Epitaxial undoped indium oxide thin films: Structural and physical properties.

机译:外延未掺杂氧化铟薄膜:结构和物理性质。

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摘要

Indium oxide thin films were grown by the pulsed electron beam deposition method on c-cut sapphire substrates at 10−2 mbar oxygen pressure and temperature up to 500 1C. Such conditions lead to the formation of dense, smooth and stoichiometric In2O3 films, with the cubic bixbyite structure. Epitaxial thin films were obtained at substrate temperatures as low as 200 1C. Pole figure measurements indicate the existence of (111) oriented In2O3 crystallites with different in-plane symmetry, i.e. three-fold and six-fold symmetry. The origin of this effect may be related to the specificities of the growth method which can induce a large disorder in the oxygen network of In2O3, leading then to a six-fold symmetry in the (111) plane of the bixbyite structure. This temperature resistivity behaviour shows metallic conductivity at room temperature and a metal– semiconductor transition at low temperature for In2O3 films grown at 200 1C, while the classical semiconductor behaviour was observed for the films grown at 400 and 500 1C. A maximum mobility of 24.7 cm2/V s was measured at 200 1C, and then it falls off with improving the crystalline quality of films. The optical transparency is high (480%) in a spectral range from 500 nm to 900 nm.
机译:氧化铟薄膜是通过脉冲电子束沉积法在10-2毫巴氧气压力和高达500 1C的温度下在C形切割蓝宝石衬底上生长的。这种情况导致形成密实,光滑和化学计量的In2O3薄膜,并具有立方方铁矿结构。外延薄膜是在低至200 1C的基板温度下获得的。极图测量表明存在(111)取向的In2O3微晶,它们具有不同的面内对称性,即三倍和六倍对称性。这种效应的起源可能与生长方法的特殊性有关,该方法可能导致In2O3的氧网络中出现较大的紊乱,从而在方铁矿结构的(111)平面中导致六重对称。对于在200 1C下生长的In2O3薄膜,该温度电阻率行为显示出室温下的金属电导率和在低温下的金属-半导体跃迁,而在400和500 1C下生长的薄膜则观察到经典的半导体行为。在200 1C下测得的最大迁移率为24.7 cm2 / V s,然后随着迁移率的提高而降低。在从500 nm到900 nm的光谱范围内,光学透明度很高(480%)。

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