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The effect of thermal annealing on the properties of thin alumina films prepared by low pressure metal-organic chemical vapour deposition

机译:热退火对低压mOCVD制备氧化铝薄膜性能的影响

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摘要

Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.
机译:通过低压金属 - 有机化学气相沉积在不锈钢,AISI 304上制备薄的非晶氧化铝膜。研究了热退火(在600,700和800℃下在600,700和800℃下的薄膜特性的影响,包括保护底层基质免受薄膜的高温腐蚀和薄膜的化学成分。 。在450℃下在含硫化氢的气体中进行的腐蚀实验表明,热退火工艺对氧化铝薄膜的保护性具有不利影响。从FTIR和螺旋钻测量开始,发现在退火过程中含有勃姆石的无定形氧化铝转化为¿-Alumina。

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