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Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

机译：三聚氰胺流速对纳米晶体化学气相沉积法对纳米晶金刚石膜生长行为的影响

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Chunlei Wu; Yanfeng Liu; Guodong Hao; Ruihua Zhu;
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1. Nanocrystalline diamond films deposited by the hot cathode direct current plasma chemical vapor deposition method with different compositions of CH4/Ar/H-2 gas mixture [J] . Zeng LY, Peng HY, Wang WB, The journal of physical chemistry, C. Nanomaterials and interfaces . 2008,第5期

机译：通过热阴极直流等离子体化学气相沉积法沉积的CH4 / Ar / H-2混合气体组成不同的纳米晶金刚石薄膜
2. Some novel aspects of nanocrystalline diamond nucleation and growth by direct current plasma assisted chemical vapor deposition [J] . Hak-Joo Lee, H. Li, Hyeongtag Jeon, Diamond and Related Materials . 2010,第11期

机译：直流等离子体辅助化学气相沉积法在纳米晶金刚石成核和生长方面的一些新颖方面
3. Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method [J] . ZHANG Chun-Mei, ZHENG Yan-Bin, JIANG Zhi-Gang, 中国物理快报：英文版 . 2010,第008期

机译：直流热阴极等离子体化学气相沉积法添加CO2对金刚石薄膜制备的影响
4. Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method [C] . Chunlei Wu, Yanfeng Liu, Guodong Hao International Conference on High-Performance Ceramics . 2020

机译：三聚氰胺流速对纳米晶体化学气相沉积法对纳米晶金刚石膜生长行为的影响
5. Microwave plasma assisted chemical vapor deposition of ultra-nanocrystalline diamond films. [D] . Huang, Wen-Shin. 2004

机译：微波等离子体辅助超纳米晶金刚石膜的化学气相沉积。
6. Doping of vanadium to nanocrystalline diamond films by hot filament chemical vapor deposition [O] . Yaozhong Zhang, Liying Zhang, Jiang Zhao, 2012

机译：通过热丝化学气相沉积将钒掺杂到纳米晶金刚石膜中
7. Growth of Si-Doped Polycrystalline Diamond Films on AlN Substrates by Microwave Plasma Chemical Vapor Deposition [O] . V.S. Sedov, A.A. Khomich, V.G. Ralchenko, 2015

机译：通过微波等离子体化学气相沉积在ALN基材上的Si掺杂多晶金刚石膜的生长
8. High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition [R] . 1997

机译：通过微波等离子体辅助化学气相沉积在高温下高生长率同质外延金刚石膜沉积

Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

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