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Removal of Ge Islands in al-induced layer-exchanged Ge thin films on glass substrates by selective etching technique

机译：通过选择性蚀刻技术在玻璃基板上移除铝基型在玻璃基板上的GE岛

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Koki Nakazawa; Kaoru Toko; Takashi Suemasu;
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1. Al-induced crystallization of amorphous Ge thin films on conducting layer coated glass substrates [J] . Koki Nakazawa, Kaoru Toko, Noritaka Usami, Japanese journal of applied physics . 2014,第4S期

机译：铝在导电层涂覆的玻璃基板上诱导非晶Ge薄膜的晶化
2. Selective wet-etching of undoped and silver photodoped amorphous thin films of chalcogenide glasses in inorganic alkaline solutions [J] . Orava J, Wagner T, Krbal M, Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2006,第9a20期

机译：在无机碱性溶液中选择性湿法蚀刻未掺杂和银掺杂的硫族化物玻璃的非晶薄膜
3. Synthesis and characterization of erbium-doped SiO2-TiO2 thin films prepared by sol-gel and dip-coating techniques onto commercial glass substrates as a route for obtaining active GRadient-INdex materials [J] . Gomez-Varela Ana I., Castro Yolanda, Duran Alicia, Thin Solid Films . 2015,第maya29期

机译：通过溶胶-凝胶和浸涂技术在工业玻璃基板上制备掺-的SiO2-TiO2薄膜的合成和表征，作为获得活性GRadient-INDex材料的途径
4. Ge Thin Films on Glass by Al-Induced Crystallization as Low-Cost Substrates for III-V Photovoltaics [C] . Kaveh Shervin, Khim Kharel, Michael Fitchette, World Conference on Photovoltaic Energy Conversion;European Photovoltaic Solar Energy Conference;Photovoltaic Science and Engineering Conference;IEEE Photovoltaic Specialist Conference . 2018

机译：Al诱导结晶在玻璃上形成Ge薄膜作为低成本的III-V光伏基板
5. The characterization of octafluorocyclobutane-based plasma discharges for the selective etching and processing of silicon dioxide and low-K dielectric thin films. [D] . Barela, Marcos J. 2003

机译：基于八氟环丁烷的等离子放电的特征，用于二氧化硅和低K介电薄膜的选择性刻蚀和处理。
6. Periodicities in the roughness and biofilm growth on glass substrate with etching time: Hydrofluoric acid etchant [O] . Susmita Chatterjee, Nupur Biswas, Alokmay Datta, -1

机译：蚀刻时间在玻璃基板上的粗糙度和生物膜生长的周期性：氢氟酸蚀刻剂
7. Temperature dependent Al-induced crystallization of amorphous Ge thin films on SiO2 substrates [O] . Toko Kaoru, Fukata Naoki, Nakazawa Koki, 2013

机译：铝在SiO2衬底上随温度变化的铝诱导晶化

Removal of Ge Islands in al-induced layer-exchanged Ge thin films on glass substrates by selective etching technique

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