首页> 外文OA文献 >Fabrication Process for Low-T_c Superconductor Electronics Devices and Its Future Prospects

【2h】

Fabrication Process for Low-T_c Superconductor Electronics Devices and Its Future Prospects

机译：低 T _{c 超导体电子设备的制造工艺及其未来前景}

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
Mutsuo HIDAKA; Shuichi NAGASAWA;
展开▼
作者单位

展开▼
年度 2017
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Prospects of application of superconducting electrodynamic structures in electronic devices for their advancement to the terahertz range [J] . Kuraev A. A., Kurkin S. A., Koronovskii A. A., Technical physics . 2015,第4期

机译：超导电动结构在电子设备中的应用前景及其发展到太赫兹范围的前景
2. A review on microscale polymerase chain reaction based methods in molecular diagnosis, and future prospects for the fabrication of fully integrated portable biomedical devices [J] . Lee Nae Yoon Mikrochimica Acta: An International Journal for Physical and Chemical Methods of Analysis . 2018,第6期

机译：基于微观聚合酶链反应的分子诊断方法的综述，以及完全集成便携式生物医学设备的制造的未来前景
3. Fabrication of solar beam steering electrowetting devices-present status and future prospects [J] . Khan I., Castelletto S., Rosengarten G. Journal of Physics, D. Applied Physics: A Europhysics Journal . 2017,第40期

机译：太阳能束指导电润湿器件的制造 - 现状和未来前景
4. Fabrication and characterization of polycrystalline samples and tape of superconducting MgB_2 -a future prospect for an electromagnet [C] . Suchitra Rajput, Sujeet Chaudhary, Dinesh K. Pandya, Symposium R on Electromagnetic Materials; 20050703-08; Singapore(SG) . 2005

机译：MgB_2超导多晶样品和带的制备与表征-电磁铁的未来前景
5. Semiconductor nanowires for future electronics: Growth, characterization, device fabrication, and integration. [D] . Dayeh, Shadi A. 2008

机译：用于未来电子产品的半导体纳米线：增长，表征，器件制造和集成。
6. Fabrication of Fully Solution Processed Inorganic Nanocrystal Photovoltaic Devices [O] . Troy K. Townsend, Dario Durastanti, William B. Heuer, 2016

机译：完全溶液处理的无机纳米晶体光伏器件的制备
7. High performance gate stack fabrication process of Ge MOS structure for future electronic devices [O] . HARUKA FUJIWARA, HIROSHI YAMADA, MITARO NAMIKI, 2018

机译：GE MOS结构的高性能门堆制造工艺未来电子设备
8. Prospects for Thin-Film Electronic Devices of High-Tc Superconductors [R] . Braginski, A. I., Forrester, M. G., Talvacchio, J., 1988

机译：高温超导体薄膜电子器件的发展前景

Fabrication Process for Low-Tc Superconductor Electronics Devices and Its Future Prospects

著录项

引文网络

相似文献

相关主题

期刊订阅

Fabrication Process for Low-T_c Superconductor Electronics Devices and Its Future Prospects