We have observed changes in the morphology of InP films grown in epiready and processed substrates. These changes are attributed to selective InP growth in areas in the submicron range due to the presence of C-based selective micromasks. Analyzing the behavior of the height-height correlation function, we show that both the roughness exponent and the correlation length changes depending on the area in which growth is taking place. For small area surfaces the correlation length increases and the roughness exponent decreases, indicating enhanced adatom relaxation due to the presence of the borders of the finite growing areas. Nonlinear terms should he included in continuum models in order to explain the observed results.
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