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Application of Deposition Technique by the Applied Surface Discharge Plasma for Hard Carbon Thin Films

机译：沉积技术在施加的表面放电等离子体中施加硬碳薄膜

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Kiyotoshi FUJII; Masayoshi SHIMIZU; Shozo INOUE;
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年度 2013
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机译：通过远程氢等离子体化学气相沉积使用氨基硅烷和硅烷前体制备的硬硅碳氮化型薄膜涂层。 1：沉积机构，化学结构和表面形态
2. Deposition of carbon films by plasma-based ion implantation using glow discharge plasma ignited by high voltage pulses applied to substrates [J] . Shinno H., Ishioka K., Kitajima M. Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2002,第3a4期

机译：通过辉光放电等离子体通过基于等离子体的离子注入沉积碳膜，该辉光放电等离子体由施加到基板的高压脉冲激发
3. Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition [J] . Rafael G. Turri, Ricardo M. Santos, Elidiane C. Rangel, Applied Surface Science . 2013,第sepa1期

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的非晶态碳质薄膜的光学，机械和表面特性
4. In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition [C] . A.D.Glew, M.A.Cappelli, M.N.Touzelbaev, Symposium on low-dielectric constant materials . 1999

机译：原位等离子体分析，通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入，热稳定性，应力和硬度比较
5. Design and implementation of a plasma enhanced chemical vapour deposition (PECVD) system for the study of carbon-60-polymer composite thin films and surface functionalization effects on carbon-60 [D] . Tariq, Amna. 2004

机译：等离子增强化学气相沉积（PECVD）系统的设计和实现，该系统用于研究碳60聚合物复合薄膜和表面功能化对碳60的影响
6. High Quality Graphene Thin Films Synthesized by Glow Discharge Method in A Chemical Vapor Deposition System Using Solid Carbon Source [O] . Le Wang, Jie Sun, Weiling Guo, 2020

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7. Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition [O] . Turri Rafael G., Santos Ricardo M., Rangel Elidiane C., 2013

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Application of Deposition Technique by the Applied Surface Discharge Plasma for Hard Carbon Thin Films

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