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DC magnetron sputtered ITO films applied with indium tin oxide targets.

机译：DC磁控管溅射ITO薄膜用氧化铟锡靶涂抹。

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Hiroshi KIMURA; Hiroshi WATANABE; Satoshi ISHIHARA; Yoshio SUZUKI; Takashi ITO;
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年度 1987
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1. Influence of the Tin Concentration in Indium Tin Oxide (ITO) Films Deposited by DC Magnetron Sputtering for Touch Panels [J] . Cho Sang Hyun, Kim Hyo Jin, Lee Sung Ho, Journal of Nanoelectronics and Optoelectronics . 2014,第3期

机译：直流磁控溅射沉积铟锡氧化物（ITO）膜中锡浓度对触摸屏的影响
2. Electrical and surface properties of indium tin oxide (ITO) films by pulsed DC magnetron sputtering for organic light emitting diode as anode material [J] . Nam E., Kang Y.-H., Son D.-J., Surface & Coatings Technology . 2010,第S1期

机译：脉冲直流磁控溅射法制备的有机发光二极管阳极材料氧化铟锡（ITO）薄膜的电学和表面性能
3. DEPOSITED INDIUM TIN OXIDE (ITO) THIN FILMS BY DC- MAGNETRON SPUTTERING ON POLYETHYLENE TEREPHTHALATE SUBSTRATE (PET) [J] . M.K.M. ALI, K. IBRAHIM, OSAMA S HAMAD, Romanian journal of physics . 2011,第5a6期

机译：直流磁控溅射法在聚乙烯对苯二甲酸酯（PET）上沉积沉积的氧化铟锡（ITO）薄膜
4. Study on Indium Tin Oxide Films Deposited Using Different Conductive ITO Targets by DC Magnetron Sputtering [C] . Joon Hong Park, Sang Chul Lee, Gun Hwan Lee, Eco-Materials Processing and Design VIII; Materials Science Forum; vols.544-545 . 2007

机译：直流磁控溅射法研究不同导电ITO靶沉积的氧化铟锡薄膜
5. Novel Thin Film Transparent Conducting Oxides Deposited by DC Reactive Magnetron Sputtering. [D] . Stevens, Blake LeRoy. 2010

机译：直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
6. Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices [O] . Jephias Gwamuri, Murugesan Marikkannan, Jeyanthinath Mayandi, 2016

机译：氧浓度对超薄射频磁控溅射沉积铟锡氧化物薄膜作为光伏器件上电极的性能的影响
7. Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films [O] . M. Marikkannan, M. Subramanian, J. Mayandi, 2015

机译：氩气，氧气和氢气环境组合对直流磁控溅射氧化铟锡薄膜性能的影响
8. Optical and Chemical Properties of Mixed-valent Rhenium Oxide Films Synthesized by Reactive DC Magnetron Sputtering. [R] . Murphy, N. R., Gallagher, R. C., Sun, L., 2015

机译：反应直流磁控溅射合成混合价铼氧化物薄膜的光化学性质。

DC magnetron sputtered ITO films applied with indium tin oxide targets.

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