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Hexagonal boron nitride grown using high atomic boron emission during microwave plasma chemical vapor deposition

机译：微波等离子体化学气相沉积期间使用高原子硼发射生长六角形氮化物

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Kallol Chakrabarty; Ivan Arnold; Shane A. Catledge;
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1. Residual compressive stress induced infrared-absorption frequency shift of hexagonal boron nitride in cubic boron nitride films prepared by plasma-enhanced chemical vapor deposition [J] . Liu Yong, Jin Panpan, Chen Aili, Journal of Applied Physics . 2012,第5期

机译：等离子体压缩化学气相沉积制备立方晶氮化硼薄膜中残余压缩应力引起的六方氮化硼红外吸收频移
2. Residual compressive stress induced infrared-absorption frequency shift of hexagonal boron nitride in cubic boron nitride films prepared by plasma-enhanced chemical vapor deposition [J] . Yong Liu, Panpan Jin, Aili Chen, Journal of Applied Physics . 2012,第5期

机译：等离子体压缩化学气相沉积制备立方晶氮化硼薄膜中残余压缩应力引起的六方氮化硼红外吸收频移
3. Atomic Resolution Imaging of Grain Boundary Defects in Monolayer Chemical Vapor Deposition-Grown Hexagonal Boron Nitride [J] . Ashley L. Gibb, Nasim Alem, Jian-Hao Chen, Journal of the American Chemical Society . 2013,第18期

机译：单层化学气相沉积生长六方氮化硼中晶粒边界缺陷的原子分辨率成像
4. Uniformity of Multilayer Hexagonal Boron Nitride Dielectric Stacks Grown by Chemical Vapor Deposition on Platinum and Copper Substrates [C] . Fei Hui, Xianhu Liang, Wenjing Fang, 2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits . 2018

机译：铂和铜基板上化学气相沉积法生长的多层六方氮化硼多层介质的均匀性
5. Chemical Vapor Deposition of Hexagonal Boron Nitride for the Development of Neutron Detectors [D] . Ahmed, Kawser. 2017

机译：用于中子探测器发展的六方氮化硼化学气相沉积
6. Precisely aligned graphene grown on hexagonal boron nitride by catalyst free chemical vapor deposition [O] . Shujie Tang, Haomin Wang, Yu Zhang, -1

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7. Microstructure of highly oriented, hexagonal, boron nitride thin films grown on crystalline silicon by radio frequency plasma-assisted chemical vapor deposition [O] . Andújar Bella José Luis, Bertrán Serra Enric, Manniete Y. 2012

机译：通过射频等离子体辅助化学气相沉积法在晶体硅上生长的高取向六方氮化硼薄膜的微观结构

Hexagonal boron nitride grown using high atomic boron emission during microwave plasma chemical vapor deposition

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