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Development of Directed Self-Assembly Materials for Sub 10 nm Patterning

机译：用于Sub 10 NM图案的定向自组装材料的开发

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Hiroyuki Komatsu; Masafumi Hori; Shinya Minegishi; Takehiko Naruoka; Tomoki Nagai;
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年度 2014
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1. Development of Directed Self-Assembly Materials for Sub 10 nm Patterning [J] . Hiroyuki Komatsu, Masafumi Hori, Shinya Minegishi Journal of Photopolymer Science and Technology . 2014,第4期

机译：用于亚10 nm图案化的定向自组装材料的开发
2. Development of Directed Self-Assembly Materials for Sub 10 nm Patterning [J] . Hiroyuki Komatsu, Masafumi Hori, Shinya Minegishi, Journal of Photopolymer Science and Technology . 2014,第4期

机译：用于亚10 nm图案化的定向自组装材料的开发
3. Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly [J] . Tsai Hsin-Yu, Miyazoe Hiroyuki, Engelmann Sebastian, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures . 2012,第6期

机译：使用定向自组装对半导体和介电材料进行30 nm以下的节距线间距图案化
4. Sub-10 nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers [C] . Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Conference on alternative lithographic technologies VII . 2016

机译：层状嵌段共聚物的石墨外延定向自组装形成亚10纳米线和空间
5. Numerical Simulations of Directed Self-assembly Methods in Di-block Copolymer Films for Efficient Manufacturing of Nanoscale Patterns with Long-range Order [D] . ?Hill, Joseph 2020

机译：二嵌段共聚物薄膜中定向自组装方法的数值模拟，用于高范围阶的纳米级图案的高效制造
6. Directed Kinetic Self-Assembly of Mounds on Patterned GaAs (001): Tunable Arrangement Pattern Amplification and Self-Limiting Growth [O] . Chuan-Fu Lin, Hung-Chih Kan, Subramaniam Kanakaraju, 2014

机译：在图案化的GaAs（001）上定向的丘堆动力学自组装：可调整的排列模式放大和自限生长
7. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing [O] . -1

机译：通过溶剂退火的亚10 -NM纳米制剂的化学模式的三嵌段共聚物的定向自组装

Development of Directed Self-Assembly Materials for Sub 10 nm Patterning

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