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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

机译：ISO / TC 201标准概述：ISO 22415表面化学分析 - 二次离子质谱法测定氩气簇溅射深度剖面中的产量体积

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Alexander G. Shard; Rasmus Havelund; Martin P. Seah; Charles A. Clifford;
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1. Summary of ISO/TC 201 Standard: ISO 22415-Surface chemical analysis-Secondary ion mass spectrometry-Method for determining yield volume in argon cluster sputter depth profiling of organic materials [J] . Shard Alexander G., Havelund Rasmus, Seah Martin P., Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2019,第10期

机译：ISO / TC 201标准概述：ISO 22415表面化学分析 - 二次离子质谱 - 用于测定氩气簇溅射深度分析中的产量体积的方法
2. Summary of ISO/TC 201 Standard: XV. ISO 20341 : 2003 - Surface chemical analysis - Secondary ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials [J] . Moon DW Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2005,第7期

机译：ISO / TC 201标准摘要：XV。 ISO 20341：2003-表面化学分析-二次离子质谱-用多种δ层参考物质估算深度分辨率参数的方法
3. Summary of ISO/TC 201 standard: X ISO 17560 : 2002 - Surface chemical analysis - Secondary ion mass spectrometry - Method for depth profiling of boron in silicon [J] . Homma Y Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2005,第1期

机译：ISO / TC 201标准摘要：X ISO 17560：2002-表面化学分析-二次离子质谱法-硅中硼深度分布的方法
4. Enhanced Surface and In-Depth Characterization of Organic and Inorganic Materials Using XPS and Soft Depth Profiling with Argon Cluster Ion Beams [C] . B. R. Strohmeier, R. G. White, T. S. Nunney, Microscopy Society of America Annual Meeting;Microanalysis Society Annual meeting;International Metallographic Society Annual meeting . 2012

机译：使用XPS和使用氩簇离子束进行软深度轮廓分析来增强有机和无机材料的表面和深度表征
5. Characterizing and utilizing a chemical ionization mass spectrometer (CIMS) as a method to estimate secondary organic aerosol yields from isoprene-derived epoxides. [D] . Marth, Wendy Jane. 2013

机译：表征并利用化学电离质谱仪（CIMS）作为从异戊二烯衍生的环氧化物估算二次有机气溶胶产量的方法。
6. SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions [O] . R. Havelund, M. P. Seah, M. Tiddia, -1

机译：有机材料的SIMS-使用负二次离子在氩气团簇深度剖面中的界面定位
7. Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry [O] . Peter J. Cumpson, Jose F. Portoles, Anders J. Barlow, 2013

机译：精确的氩聚类离子溅射产生：通过X射线光电子能谱和二次离子质谱法测量在实际深度分析中的溅射阈值的产量和效果
8. Gas chromatograph/mass spectrometry method for determining isotopic distributions in organic compounds used in the chemical approach to stable isotope separation. [R] . Martinez, A. M., Spall, W. D., Smith, B. F. 1990

机译：用于确定用于稳定同位素分离的化学方法中的有机化合物中的同位素分布的气相色谱/质谱法。

Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

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