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Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments

机译：通过二乙基锌和1.5-戊二醇在各种退火处理后由低温Ald制备的ZnS超薄膜的结构和光学表征

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Maksymilian Włodarski; Urszula Chodorow; Stanisław Jóźwiak; Matti Putkonen; Tomasz Durejko; Timo Sajavaara; Małgorzata Norek;
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1. Structural, microstructural and optical properties of Cu$_2$ZnSnS$_4$ thin films prepared by thermal evaporation: effect of substrate temperature and annealing [J] . U CHALAPATHI, S UTHANNA, V SUNDARA RAJA Bulletin of materials science . 2017,第5期

机译：热蒸发制备的Cu $ _2 $ ZnSnS $ _4 $薄膜的结构，微结构和光学性质：衬底温度和退火的影响
2. Structural, microstructural and optical properties of Cu2ZnSnS4 thin films prepared by thermal evaporation: effect of substrate temperature and annealing [J] . Chalapathi U., Uthanna S., Raja V. Sundara Bulletin of Materials Science . 2017,第5期

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3. Effect of thickness and sulfur-free annealing atmosphere on the structural, optical and electrical properties of Cu (2) ZnSnS4 thin films prepared by dip-coating technique [J] . Kieu Loan Phan Thi, Dao Anh Tuan, Nguyen Huu Ke, Journal of Sol-Gel Science and Technology . 2017,第2期

机译：厚度和硫退火气氛对通过浸涂技术制备的Cu（2）ZnSNS4薄膜的结构，光学和电性能的影响
4. Growth and characterization of Cd/sub 0.22/Zn/sub 0.78/S thin films prepared by spray pyrolysis method :Optical and structural properties [C] . Baykul M.C., Orhan N., Gulec A. Electromagnetic Compatibility Symposium Record, 1968 IEEE . -1

机译：喷雾热解法制备Cd / sub 0.22 / Zn / sub 0.78 / S薄膜的生长与表征：光学和结构性质
5. Structural, Electrical and Optical Characterization of Thiol Treated PbTe Thin Films Infilled by Alumina ALD [D] . Micone, Juliette Alyssa Hunter. 2018

机译：氧化铝填充的Thiol处理的PbTe薄膜的结构，电学和光学特性
6. Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments [O] . Maksymilian Włodarski, Urszula Chodorow, Stanisław Jóźwiak, 2019

机译：低温ALD法制备的二乙基锌和1.5-戊二硫醇低温ALD制备ZnS超薄膜的结构和光学表征。
7. Comparison of Nitrogen and Oxygen Annealing Effects on the Structural, Optical and Electrical Properties of ALD-ZnO Thin Films [O] . Y. K. Park, A. N. Park, C. M. Lee 2005

机译：氮气退火效应对Ald-ZnO薄膜结构，光学和电性能的比较

Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments

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