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Analysis of Dry Shrinkage Flow Process of Spin-Coated Film on Grooved Semiconductor Wafers.

机译：沟槽半导体晶片上旋涂膜的干收缩流程分析。

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Shigeki HIRASAWA; Hiroki NEZU; Naofumi OHASHI; Hiroyuki MARUYAMA; Yoko SAITO;
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年度 1996
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1. Analysis of drying shrinkage and flow due to surface tension of spin-coated films on topographic substrates [J] . Hirasawa S., Saito Y. IEEE Transactions on Semiconductor Manufacturing . 1997,第4期

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2. Preparation and analysis of amorphous carbon films deposited from (C_6H_12)/Ar/He chemistry for application as the dry etch hard mask in the semiconductor manufacturing process [J] . Seungmoo Lee, Jaihyung Won, Jongsik Choi, Thin Solid Films . 2011,第20期

机译：由（C_6H_12）/ Ar / He化学沉积的非晶碳膜的制备和分析，用作半导体制造工艺中的干法蚀刻硬掩模
3. Effect of deposition temperature and thermal annealing on the dry etch rate of a-C: H films for the dry etch hard process of semiconductor devices [J] . Seung Moo Lee, Jaihyung Won, Soyoung Yim, Thin Solid Films . 2012,第16期

机译：沉积温度和热退火对半导体器件干法刻蚀工艺中a-C：H膜干法刻蚀速率的影响
4. THIN-FILM TRANSISTORS BASED ON SPIN-COATED CHALCOGENIDE SEMICONDUCTOR CHANNELS [C] . David B. Mitzi, Matthew Copel, Conal E. Murray, Symposium on Thin Film Transistor Technologies . 2005

机译：基于旋涂的硫属化物半导体通道的薄膜晶体管
5. An environmental scanning electron microscope investigation of drying cement paste: Drying shrinkage, image analysis, and modeling. [D] . Bergstrom, Todd Bruce. 1993

机译：水泥浆干燥的环境扫描电子显微镜研究：干燥收缩，图像分析和建模。
6. Regulation of the forming process and the set voltage distribution of unipolar resistance switching in spin-coated CoFe2O4 thin films [O] . Millaty Mustaqima, Pilsun Yoo, Wei Huang, 2015

机译：旋涂CoFe2O4薄膜的形成过程和单极电阻切换的设定电压分布的调节
7. Controlling the Dominant Length Scale of Liquid-Liquid Phase Separation in Spin-coated Organic Semiconductor Films [O] . Jacobus J. van Franeker, Daniel Westhoff, Mathieu Turbiez, 2014

机译：控制旋涂有机半导体膜中液液相分离的显着长度标度
8. One-dimensional analysis of sol-gel film-coating drying: Pore evolution, network shrinkage and stress development [R] . Chen, K. S., Schunk, P. R. 1998

机译：溶胶 - 凝胶薄膜 - 涂层干燥的一维分析：孔隙演变，网络收缩和应力发展

Analysis of Dry Shrinkage Flow Process of Spin-Coated Film on Grooved Semiconductor Wafers.

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