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Application-Specific Oxide-Based and Metal-Dielectric Thin Film Materials Prepared by RF Magnetron Sputtering

机译：通过RF磁控溅射制备的特定氧化物基和金属介电薄膜材料

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Mohammad Nur E Alam; Wade Lonsdale; Mikhail Vasiliev; Kamal Alameh;
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1. Optical and Chromaticity Properties of Metal-Dielectric Composite-Based Multilayer Thin-Film Structures Prepared by RF Magnetron Sputtering [J] . Mohammad Nur-E-Alam, Momtazur Rahman, Mohammad Khairul Basher, Coatings . 2020,第3期

机译：由RF磁控溅射制备的金属 - 介电复合材料的多层薄膜结构的光学和色度性能
2. STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF BI(X)SI(Y)O(Z) THIN FILMS PREPARED VIA UNBALANCED MAGNETRON SPUTTERING ( PROPIEDADES ESTRUCTURALES Y MORFOLOGICAS DE PELICULAS DELGADAS DE BI(X)SI(Y)O(Z) PRODUCIDAS POR LA TECNICA DE UNBALANCED MAGNETRON SPUTTERING ) [J] . Giovany Orozco Hernández, Jhon Jairo Olaya Flórez Revista Latinoamericana de Metalurgia y Materiales . 2015,第2期

机译：通过不平衡磁控溅射制备的BI（X）SI（Y）O（Z）薄膜的结构和形态学特性磁控溅射平衡）
3. Characteristics of Tin Oxide-Based Thin Film Transistors Prepared by DC Magnetron Sputtering [J] . Yeon-Keon Moon, Woong-Sun Kim, Kyung-Taek Kim, Journal of nanoscience and nanotechnology . 2012,第4期

机译：直流磁控溅射制备氧化锡基薄膜晶体管的特性
4. Electronic structure of LiCoO_2 and LiNiO_2 bulk materials and thin films prepared by magnetron sputtering [C] . David Ensling, Qi-Hui Wu, Javier Fernandez-Madrigal, The Meeting of the Electrochemical Society . 2003

机译：LiCoO_2的电子结构和LINIO_2散装材料和磁控溅射制备的薄膜
5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

机译：非垂直入射反应磁控溅射制备的金属氮化物（氮化铝，氮化钛，氮化ha）薄膜的织构演变。
6. Application-Specific Oxide-Based and Metal–Dielectric Thin-Film Materials Prepared by Radio Frequency Magnetron Sputtering [O] . Mohammad Nur-E-Alam, Wade Lonsdale, Mikhail Vasiliev, 2019

机译：射频磁控溅射制备基于特定用途的氧化物基和金属介电薄膜材料
7. Application-specific oxide-based and metal-dielectric thin-film materials prepared by RF sputtering [O] . Mohammad Nur E Alam, Mikhail Vasiliev 2019

机译：采用RF溅射制备的特异性氧化物基和金属介电薄膜材料

Application-Specific Oxide-Based and Metal-Dielectric Thin Film Materials Prepared by RF Magnetron Sputtering

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