首页> 外文OA文献 >Mechanistic Features of Nanodiamonds in the Lapping of Magnetic Heads
【2h】

Mechanistic Features of Nanodiamonds in the Lapping of Magnetic Heads

机译:磁头研磨中纳米金刚石的机械特征

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。
获取外文期刊封面目录资料

摘要

Nanodiamonds, which are the main components of slurry in the precision lapping process of magnetic heads, play an important role in surface quality. This paper studies the mechanistic features of nanodiamond embedment into a Sn plate in the lapping process. This is the first study to develop mathematical models for nanodiamond embedment. Such models can predict the optimum parameters for particle embedment. From the modeling calculations, the embedded pressure satisfies p0=3/2·W/πa2 and the indentation depth satisfies δ=k1P/HV. Calculation results reveal that the largest embedded pressure is 731.48 GPa and the critical indentation depth δ is 7 nm. Atomic force microscopy (AFM), scanning electron microscopy (SEM), and Auger electron spectroscopy (AES) were used to carry out surface quality detection and analysis of the disk head. Both the formation of black spots on the surface and the removal rate have an important correlation with the size of nanodiamonds. The results demonstrate that an improved removal rate (21 nm·min−1) can be obtained with 100 nm diamonds embedded in the plate.
机译:纳米二胺是磁头精密研磨过程中浆料的主要成分,在表面质量上发挥着重要作用。本文研究了纳米胺嵌入式在研磨过程中的SN板中的机械特征。这是第一次开发纳米金刚石嵌入数学模型的研究。这种模型可以预测粒子嵌入的最佳参数。根据建模计算,嵌入式压力满足P0 = 3/2·w /π2,并且压痕深度满足Δ= K1p / HV。计算结果表明,最大的嵌入压力为731.48GPa,并且临界压痕深度δ为7nm。原子力显微镜(AFM),扫描电子显微镜(SEM)和螺旋钻电子光谱(AES)用于进行磁盘头的表面质量检测和分析。表面上的黑点的形成和去除率都与纳米金刚石的大小有着重要的相关性。结果表明,通过嵌入板中的100nm金刚石可以获得改善的去除率(21nm·min-1)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号