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Hydrogen reactive sputtered a-C:H thin films doped with various metals.

机译：氢反应性溅射A-C：H掺杂有各种金属的H薄膜。

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Misuzu Watanabe; Kazuhiko Kawakami; Yoshiki Morikawa; Masako Tanaka; Masao Hayashi; Masanori Haba;
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年度 1987
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1. Reactively co-sputter deposited a-C:H/Cr thin films: Material characteristics and optical properties [J] . Hsin-Yen Cheng, Jau-Wern Chiou, Jyh-Ming Ting, Thin Solid Films . 2013,第FEBa1期

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3. A single quality factor for the deposition process of reactively sputtered thin a-C : H : N films [J] . Messina G., Santangelo S., Tagliaferro A., Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2003,第3期

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4. Characterization of Pt-doped V_2O_5 thin film for cathode of thin film battery by a direct current reactive sputtering method [C] . Eun Jeong Jeon, Sang Cheol Nam, Won Il Cho, Electrochemical Society . 2003

机译：直流反应溅射法对薄膜电池阴极的PT掺杂V_2O_5薄膜的表征
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7. Synthesis and Lubricant Properties of Nitrogen doped Amorphous Carbon (a-C:N) Thin Films by Closed-field unbalanced Magnetron Sputtering Method [O] . 2007

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Hydrogen reactive sputtered a-C:H thin films doped with various metals.

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