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Experimental Setup of the Fast Current Controller for the Buenos Aires Heavy Ion Microbeam

机译:Buenos Aires重离子微沟的快速电流控制器的实验设置

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摘要

Recently we used the heavy ion microprobe of the Buenos Aires TANDAR Laboratory for Single Event Effects (SEE) and Total Dose (TD) experiments in electronics devices and components, requiring very low beam currents. The facility includes a fast beam switch that allows the control of the ion beam current and a mobile Si PIN (p-type, intrinsic, n-type) diode that directly measures the number of ions hitting the device. The fast beam deflector was used to reduce the current by producing a pulsed beam or generating a quasi-continuous (Poisson-like distributed) beam with currents ranging from tens to hundreds of ions/s. As an application for this current control method we present a single event effect (SEE) pulses map generated by a 32S8+ beam at 75 MeV on two 0.5 µm technology CMOS digital output buffers where the device was formed by cascading four CMOS inverters with increasing sizes from input to output to drive large loads. Using the same concept of pulse width modulated deflection, we developed a novel gradient scanning method. This system allows to produce in a single irradiation a distribution with a cumulative damage with a difference of two orders of magnitude at constant gradient. To demonstrate the method, we irradiated a lithium niobate monocrystal with 32S8+ beam at 75 MeV energy and later analyzed the produced damage by the micro-Raman technique and an optical profilometer.
机译:最近,我们在使用的电子设备和元件的布宜诺斯艾利斯TANDAR实验室单粒子效应(SEE)和总剂量(TD)试验的重离子微探针,需要非常低的束电流。该设施包括一个快速光束开关,其允许离子束电流和移动的Si PIN(P型,本征,n型)二极管直接测量离子撞击装置的数量的控制。快速光束偏转器被用来通过产生脉冲光束或产生准连续的(泊松状分布)与电流范围从几十到几百的离子束/秒,以减少的电流。作为用于该电流控制方法的应用中,我们提出了一种单粒子效应地图由32S8 +束产生(SEE)脉冲在75兆电子伏上,其中该设备是由级联4个的CMOS反相器具有增大的尺寸形成的两个0.5微米技术CMOS数字输出缓冲器输入输出驱动较大的负载。使用脉冲宽度调制偏转的相同的概念,我们开发了一种新梯度扫描方法。该系统允许在单次照射,以产生具有与恒定的梯度两个数量级的差的累积损坏的分布。为了证明该方法中,我们所照射的铌酸锂单晶在75兆电子伏的能量32S8 +束和以后分析由微拉曼技术和光学轮廓所产生的损坏。

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